Masayuki Nakatsu

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Niigata-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photomask blank substrate, photomask blank and photomask
- Patent number 7,351,504
- Issue date Apr 1, 2008
- Shin-Etsu Chemical Co., Ltd.
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making photomask blank substrates
- Patent number 7,344,808
- Issue date Mar 18, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Numanami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selecting photomask blank substrates
- Patent number 7,329,475
- Issue date Feb 12, 2008
- Shin-Estu Chemical Co., Ltd.
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and method of manufacture
- Patent number 7,179,567
- Issue date Feb 20, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selecting photomask blank substrates
- Patent number 7,070,888
- Issue date Jul 4, 2006
- Shin-Etsu Chemical Co., Ltd.
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of making photomask blank substrates
- Publication number 20050020083
- Publication date Jan 27, 2005
- Tsuneo Numanami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of selecting photomask blank substrates
- Publication number 20050019676
- Publication date Jan 27, 2005
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank substrate, photomask blank and photomask
- Publication number 20050019677
- Publication date Jan 27, 2005
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of selecting photomask blank substrates
- Publication number 20050019678
- Publication date Jan 27, 2005
- Masayuki Nakatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, phase shift mask, and method of manufacture
- Publication number 20030235767
- Publication date Dec 25, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, phase shift mask, and method of manufacture
- Publication number 20030025216
- Publication date Feb 6, 2003
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY