Masayuki Oba

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Negative photosensitive polymer composition of a thermosetting poly...
- Patent number 6,159,654
- Issue date Dec 12, 2000
- Kabushiki Kaisha Toshiba
- Shigeru Machida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist, method of forming a resist pattern and manufacturing an ele...
- Patent number 5,756,254
- Issue date May 26, 1998
- Kabushiki Kaisha Toshiba
- Naoko Kihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide precursor composition, method of forming polyimide film,...
- Patent number 5,756,650
- Issue date May 26, 1998
- Kabushiki Kaisha Toshiba
- Yoshiaki Kawamonzen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyamic acid composition
- Patent number 5,753,407
- Issue date May 19, 1998
- Kabushiki Kaisha Toshiba
- Masayuki Oba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyamic acid composition
- Patent number 5,585,217
- Issue date Dec 17, 1996
- Kabushiki Kaisha Toshiba
- Masayuki Oba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, bismaleimide-based cured resin precursor and e...
- Patent number 5,578,697
- Issue date Nov 26, 1996
- Kabushiki Kaisha Toshiba
- Yoshiaki Kawamonzen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming polyimide film pattern
- Patent number 5,518,864
- Issue date May 21, 1996
- Kabushiki Kaisha Toshiba
- Masayuki Oba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition for forming polyimide film pattern...
- Patent number 5,348,835
- Issue date Sep 20, 1994
- Kabushiki Kaisha Toshiba
- Masayuki Oba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition and resin-encapsulated semiconductor device
- Patent number 5,340,684
- Issue date Aug 23, 1994
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Curable resin composition comprising N-(alkenylphenyl)maleimide, ep...
- Patent number 4,506,042
- Issue date Mar 19, 1985
- Mitsui Toatsu Chemicals, Inc.
- Hikotada Tsuboi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for the preparation of N-alkenylphenylmaleimides and N,N'-[...
- Patent number 4,500,719
- Issue date Feb 19, 1985
- Mitsui Toatsu Chemicals, Incorporated
- Masayuki Oba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Curable resin composition comprising N-(alkenylphenyl)maleimide and...
- Patent number 4,401,777
- Issue date Aug 30, 1983
- Mitsui Toatsu Chemicals, Inc.
- Hikotada Tsuboi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
N-Substituted phenyl maleimides
- Patent number 4,400,521
- Issue date Aug 23, 1983
- Mitsui Toatsu Chemicals, Incorporated
- Masayuki Oba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
N-Alkenylphenylmaleimides and N,N'-[alkenylene phenylene]bismaleimi...
- Patent number 4,376,206
- Issue date Mar 8, 1983
- Mitsui Toatsu Chemicals, Inc.
- Masayuki Oba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thermosetting resin compositions comprising bismaleimides and alken...
- Patent number 4,323,662
- Issue date Apr 6, 1982
- Mitsui Toatsu Chemicals, Inc.
- Masayuki Oba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for the production of N-(hydroxyphenyl) maleimides
- Patent number 4,289,699
- Issue date Sep 15, 1981
- Mitsui Toatsu Chemicals, Incorporated
- Masayuki Oba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of N-(hydroxyphenyl) maleimides
- Patent number 4,231,934
- Issue date Nov 4, 1980
- Mitsui Toatsu Chemicals, Incorporated
- Masayuki Oba
- C07 - ORGANIC CHEMISTRY

Masayuki Oba

Person

Patents Grantslast 30 patents

Negative photosensitive polymer composition of a thermosetting poly...

Resist, method of forming a resist pattern and manufacturing an ele...

Polyimide precursor composition, method of forming polyimide film,...

Polyamic acid composition

Polyamic acid composition

Polyimide precursor, bismaleimide-based cured resin precursor and e...

Method of forming polyimide film pattern

Photosensitive resin composition for forming polyimide film pattern...

Photosensitive composition and resin-encapsulated semiconductor device

Curable resin composition comprising N-(alkenylphenyl)maleimide, ep...

Process for the preparation of N-alkenylphenylmaleimides and N,N'-[...

Curable resin composition comprising N-(alkenylphenyl)maleimide and...

N-Substituted phenyl maleimides

N-Alkenylphenylmaleimides and N,N'-[alkenylene phenylene]bismaleimi...

Thermosetting resin compositions comprising bismaleimides and alken...

Process for the production of N-(hydroxyphenyl) maleimides

Process for the production of N-(hydroxyphenyl) maleimides