Masayuki Ohe

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Hitachi-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Polyimide precursor, photosensitive resin composition containing sa...
- Patent number 9,751,984
- Issue date Sep 5, 2017
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tetsuya Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, method for forming patte...
- Patent number 8,420,291
- Issue date Apr 16, 2013
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer composition, method for forming relief patte...
- Patent number 6,514,658
- Issue date Feb 4, 2003
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Masataka Nunomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymer composition, method for forming relief patte...
- Patent number 6,329,110
- Issue date Dec 11, 2001
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYIMIDE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SA...
- Publication number 20150353685
- Publication date Dec 10, 2015
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tetsuya ENOMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMIDE PRECURSOR RESIN COMPOSITION
- Publication number 20150337116
- Publication date Nov 26, 2015
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Keishi ONO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTE...
- Publication number 20100258336
- Publication date Oct 14, 2010
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive polymer composition, method for forming relief patte...
- Publication number 20010031419
- Publication date Oct 18, 2001
- Masataka Nunomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY