Masayuki Oie

Person

Kamakura, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition
- Patent number 5,773,190
- Issue date Jun 30, 1998
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming chemically amplified resist pattern and manufactu...
- Patent number 5,707,784
- Issue date Jan 13, 1998
- Fujitsu Ltd.
- Akira Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 5,688,628
- Issue date Nov 18, 1997
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,532,107
- Issue date Jul 2, 1996
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition comprising a polyphenolic o-quinone dia...
- Patent number 5,306,596
- Issue date Apr 26, 1994
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing quinone diazide sulfonate es...
- Patent number 5,166,033
- Issue date Nov 24, 1992
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing alkali-soluble phenolic resi...
- Patent number 5,112,719
- Issue date May 12, 1992
- Nippon Zeon Co., Ltd.
- Takamasa Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition containing a pyrazole compound anti-halatio...
- Patent number 4,654,292
- Issue date Mar 31, 1987
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masayuki Oie

Person

Patents Grantslast 30 patents

Resist composition

Method of forming chemically amplified resist pattern and manufactu...

Resist composition

Positive resist composition

Positive resist composition comprising a polyphenolic o-quinone dia...

Positive resist composition containing quinone diazide sulfonate es...

Positive resist composition containing alkali-soluble phenolic resi...

Photoresist composition containing a pyrazole compound anti-halatio...