Masayuki SHIINA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,501
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210398777
- Publication date Dec 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170092468
- Publication date Mar 30, 2017
- Hitachi High-Technologies Corporation
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS