Masayuki Tomoyasu

Person

Seongnam-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and method of processing a substrate
- Patent number 11,837,496
- Issue date Dec 5, 2023
- Samsung Electronics Co., Ltd.
- Jong Woo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring, chuck assembly for securing a substrate and plasma trea...
- Patent number 11,817,298
- Issue date Nov 14, 2023
- Samsung Electronics Co., Ltd.
- Incheol Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of processing a substrate
- Patent number 11,791,194
- Issue date Oct 17, 2023
- Samsung Electronics Co., Ltd.
- Jong Woo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively-coupled plasma substrate processing apparatus includin...
- Patent number 11,450,545
- Issue date Sep 20, 2022
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including edge ring
- Patent number 11,018,046
- Issue date May 25, 2021
- Samsung Electronics Co., Ltd.
- Jong Woo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, method of managing the same and method...
- Patent number 9,859,175
- Issue date Jan 2, 2018
- SAMSUNG ELECTRONICS CO., LTD.
- Kiwook Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 9,799,561
- Issue date Oct 24, 2017
- Samsung Electronics Co., Ltd.
- Chan-Hoon Park
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FOCUS RING, CHUCK ASSEMBLY FOR SECURING A SUBSTRATE AND PLASMA TREA...
- Publication number 20210305021
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Incheol SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE
- Publication number 20210272838
- Publication date Sep 2, 2021
- Samsung Electronics Co., Ltd.
- Jong Woo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY-COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS INCLUDIN...
- Publication number 20200335376
- Publication date Oct 22, 2020
- Samsung Electronics Co., Ltd.
- Jongwoo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING EDGE RING
- Publication number 20200328105
- Publication date Oct 15, 2020
- SAMSUNG ELECTRONICS CO., LTD.
- Jong Woo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20170053828
- Publication date Feb 23, 2017
- Samsung Electronics Co., Ltd.
- Chan-Hoon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20170047200
- Publication date Feb 16, 2017
- Samsung Electronics Co., Ltd.
- Hyung-Joo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING APPARATUS
- Publication number 20170032987
- Publication date Feb 2, 2017
- Samsung Electronics Co., Ltd.
- Hyung-Joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, METHOD OF MANAGING THE SAME AND METHOD...
- Publication number 20160372386
- Publication date Dec 22, 2016
- Samsung Electronics Co., Ltd.
- Kiwook SONG
- B08 - CLEANING

Masayuki Tomoyasu

Person

Patents Grantslast 30 patents

Substrate processing apparatus and method of processing a substrate

Focus ring, chuck assembly for securing a substrate and plasma trea...

Substrate processing apparatus and method of processing a substrate

Capacitively-coupled plasma substrate processing apparatus includin...

Substrate processing apparatus including edge ring

Substrate processing system, method of managing the same and method...

Method for fabricating a semiconductor device

Patents Applicationslast 30 patents

FOCUS RING, CHUCK ASSEMBLY FOR SECURING A SUBSTRATE AND PLASMA TREA...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE

CAPACITIVELY-COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS INCLUDIN...

SUBSTRATE PROCESSING APPARATUS INCLUDING EDGE RING

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

Plasma Processing Apparatus

DRY ETCHING APPARATUS

SUBSTRATE PROCESSING SYSTEM, METHOD OF MANAGING THE SAME AND METHOD...