Masunori Ishihara

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Kudamatsu-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 8,277,563
- Issue date Oct 2, 2012
- Hitachi High-Technologies Corporation
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 8,207,066
- Issue date Jun 26, 2012
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,909,933
- Issue date Mar 22, 2011
- Hitachi High-Technologies Corporation
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20110120495
- Publication date May 26, 2011
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100255612
- Publication date Oct 7, 2010
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20090214401
- Publication date Aug 27, 2009
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD FOR ETCHING SAMPLE
- Publication number 20090081872
- Publication date Mar 26, 2009
- Hitoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Method
- Publication number 20080216865
- Publication date Sep 11, 2008
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20060016781
- Publication date Jan 26, 2006
- Kenichi Kuwabara
- H01 - BASIC ELECTRIC ELEMENTS