Matthew C. Gwinn

Person

Winchendon, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer scanning apparatus and method for focused beam processing
- Patent number 11,915,906
- Issue date Feb 27, 2024
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Matthew Gwinn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuning gas cluster ion beam systems
- Patent number 11,715,620
- Issue date Aug 1, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,694,872
- Issue date Jul 4, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer scanning apparatus and method for focused beam processing
- Patent number 11,587,760
- Issue date Feb 21, 2023
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,450,506
- Issue date Sep 20, 2022
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,861,674
- Issue date Dec 8, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,497,540
- Issue date Dec 3, 2019
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process gas enhancement for beam treatment of a substrate
- Patent number 9,735,019
- Issue date Aug 15, 2017
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GCIB nozzle assembly
- Patent number 9,343,259
- Issue date May 17, 2016
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular beam enhanced GCIB treatment
- Patent number 9,236,221
- Issue date Jan 12, 2016
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination scanner for GCIB system
- Patent number 9,029,808
- Issue date May 12, 2015
- TEL Epion Inc.
- Matthew C. Gwinn
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multiple nozzle gas cluster ion beam system
- Patent number 8,981,322
- Issue date Mar 17, 2015
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanner for GCIB system
- Patent number 8,791,430
- Issue date Jul 29, 2014
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of irradiating substrate with gas cluster ion beam formed fr...
- Patent number 8,304,033
- Issue date Nov 6, 2012
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple nozzle gas cluster ion beam processing system and method o...
- Patent number 8,097,860
- Issue date Jan 17, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling a gas cluster ion beam formed...
- Patent number 7,825,389
- Issue date Nov 2, 2010
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for reducing particulate contamination in gas...
- Patent number 7,642,531
- Issue date Jan 5, 2010
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for scanning a workpiece through an ion beam
- Patent number 7,608,843
- Issue date Oct 27, 2009
- TEL Epion Inc.
- Avrum Freytsis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved processing with a gas-cluster ion...
- Patent number 7,060,989
- Issue date Jun 13, 2006
- Epion Corporation
- David R. Swenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved beam stability in high current ga...
- Patent number 7,060,988
- Issue date Jun 13, 2006
- Epion Corporation
- Michael E. Mack
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS SYSTEM, METHOD, AND SUBSTRATE CHUCK
- Publication number 20250022739
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Matthew Charles Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SCANNING APPARATUS WITH PENDULUM AND ROTATABLE SUBSTRATE...
- Publication number 20240290619
- Publication date Aug 29, 2024
- TEL Manufacturing and Engineering of America, Inc.
- Kevin Siefering
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Scanning Apparatus and Method for Focused Beam Processing
- Publication number 20230187168
- Publication date Jun 15, 2023
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SCANNING APPARATUS WITH PENDULUM AND ROTATABLE SUBSTRATE...
- Publication number 20230021625
- Publication date Jan 26, 2023
- TEL Manufacturing and Engineering of America, Inc.
- Kevin Siefering
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning Gas Cluster Ion Beam Systems
- Publication number 20220359155
- Publication date Nov 10, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Automated Fault Detection in Microfabrication
- Publication number 20220351997
- Publication date Nov 3, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20220277924
- Publication date Sep 1, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20210335568
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Scanning Apparatus and Method for Focused Beam Processing
- Publication number 20210335642
- Publication date Oct 28, 2021
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compensated Location Specific Processing Apparatus And Method
- Publication number 20200066485
- Publication date Feb 27, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD
- Publication number 20180197715
- Publication date Jul 12, 2018
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS ENHANCEMENT FOR BEAM TREATMENT OF A SUBSTRATE
- Publication number 20160071734
- Publication date Mar 10, 2016
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GCIB NOZZLE ASSEMBLY
- Publication number 20160042909
- Publication date Feb 11, 2016
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLECULAR BEAM ENHANCED GCIB TREATMENT
- Publication number 20150144786
- Publication date May 28, 2015
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONTAMINATION SCANNER FOR GCIB SYSTEM
- Publication number 20140332696
- Publication date Nov 13, 2014
- Matthew C. GWINN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE
- Publication number 20130082189
- Publication date Apr 4, 2013
- TEL Epion Inc.
- Robert K. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNER FOR GCIB SYSTEM
- Publication number 20120223249
- Publication date Sep 6, 2012
- TEL Epion Inc.
- Matthew C. GWINN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-VOLTAGE GAS CLUSTER ION BEAM (GCIB) PROCESSING SYSTEM
- Publication number 20110240602
- Publication date Oct 6, 2011
- TEL Epion Inc.
- Robert K. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...
- Publication number 20100193708
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...
- Publication number 20100193472
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM
- Publication number 20100193701
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for controlling a gas cluster ion beam formed...
- Publication number 20090140165
- Publication date Jun 4, 2009
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REDUCING PARTICULATE CONTAMINATION IN GAS...
- Publication number 20080048132
- Publication date Feb 28, 2008
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SCANNING A WORKPIECE THROUGH AN ION BEAM
- Publication number 20070262267
- Publication date Nov 15, 2007
- Epion Corporation
- Avrum Freytsis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved processing with a gas-cluster ion...
- Publication number 20050205802
- Publication date Sep 22, 2005
- Epion Corporation
- David R. Swenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved beam stability in high current ga...
- Publication number 20050205801
- Publication date Sep 22, 2005
- Epion Corporation
- Michael E. Mack
- H01 - BASIC ELECTRIC ELEMENTS

Matthew C. Gwinn

Person

Patents Grantslast 30 patents

Wafer scanning apparatus and method for focused beam processing

Tuning gas cluster ion beam systems

Pattern enhancement using a gas cluster ion beam

Wafer scanning apparatus and method for focused beam processing

Pattern enhancement using a gas cluster ion beam

Compensated location specific processing apparatus and method

Compensated location specific processing apparatus and method

Process gas enhancement for beam treatment of a substrate

GCIB nozzle assembly

Molecular beam enhanced GCIB treatment

Low contamination scanner for GCIB system

Multiple nozzle gas cluster ion beam system

Scanner for GCIB system

Method of irradiating substrate with gas cluster ion beam formed fr...

Multiple nozzle gas cluster ion beam processing system and method o...

Method and apparatus for controlling a gas cluster ion beam formed...

Apparatus and method for reducing particulate contamination in gas...

Method and apparatus for scanning a workpiece through an ion beam

Method and apparatus for improved processing with a gas-cluster ion...

Method and apparatus for improved beam stability in high current ga...

Patents Applicationslast 30 patents

PROCESS SYSTEM, METHOD, AND SUBSTRATE CHUCK

SUBSTRATE SCANNING APPARATUS WITH PENDULUM AND ROTATABLE SUBSTRATE...

Wafer Scanning Apparatus and Method for Focused Beam Processing

SUBSTRATE SCANNING APPARATUS WITH PENDULUM AND ROTATABLE SUBSTRATE...

Tuning Gas Cluster Ion Beam Systems

Automated Fault Detection in Microfabrication

Pattern Enhancement Using a Gas Cluster Ion Beam

Pattern Enhancement Using a Gas Cluster Ion Beam

Wafer Scanning Apparatus and Method for Focused Beam Processing

Compensated Location Specific Processing Apparatus And Method

COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD

PROCESS GAS ENHANCEMENT FOR BEAM TREATMENT OF A SUBSTRATE

GCIB NOZZLE ASSEMBLY

MOLECULAR BEAM ENHANCED GCIB TREATMENT

LOW CONTAMINATION SCANNER FOR GCIB SYSTEM

PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE

SCANNER FOR GCIB SYSTEM

HIGH-VOLTAGE GAS CLUSTER ION BEAM (GCIB) PROCESSING SYSTEM

METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM

Method and apparatus for controlling a gas cluster ion beam formed...

APPARATUS AND METHOD FOR REDUCING PARTICULATE CONTAMINATION IN GAS...

METHOD AND APPARATUS FOR SCANNING A WORKPIECE THROUGH AN ION BEAM

Method and apparatus for improved processing with a gas-cluster ion...

Method and apparatus for improved beam stability in high current ga...