Matthew C. Nicholls

Person

South Burlington, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Overlay and CD process window structure
- Patent number 7,538,344
- Issue date May 26, 2009
- International Business Machines Corporation
- Daniel J. Mellinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
HDP-based ILD capping layer
- Patent number 7,372,158
- Issue date May 13, 2008
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HDP-based ILD capping layer
- Patent number 7,138,717
- Issue date Nov 21, 2006
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-run selective pattern and etch wafer process
- Patent number 7,060,626
- Issue date Jun 13, 2006
- International Business Machines Corporation
- Kenneth A. Bandy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay and CD process window structure
- Patent number 6,967,709
- Issue date Nov 22, 2005
- International Business Machines Corporation
- Daniel J. Mellinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of photolithographic exposure dose control as a function of...
- Patent number 6,856,378
- Issue date Feb 15, 2005
- International Business Machines Corporation
- Keith J. Machia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask/wafer control structure and algorithm for placement
- Patent number 6,766,507
- Issue date Jul 20, 2004
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining overlay tolerance
- Patent number 6,716,559
- Issue date Apr 6, 2004
- International Business Machines Corporation
- Robert K. Leidy
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of photolithographic exposure dose control as a function of...
- Patent number 6,674,516
- Issue date Jan 6, 2004
- International Business Machines Corporation
- Keith J. Machia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMPROVED HDP-BASED ILD CAPPING LAYER
- Publication number 20070004206
- Publication date Jan 4, 2007
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED HDP-BASED ILD CAPPING LAYER
- Publication number 20060113672
- Publication date Jun 1, 2006
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Overlay and CD process window structure
- Publication number 20050181288
- Publication date Aug 18, 2005
- International Business Machines Corporation
- Daniel J. Mellinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY AND CD PROCESS WINDOW STRUCTURE
- Publication number 20050110969
- Publication date May 26, 2005
- International Business Machines Corporation
- Daniel J. Mellinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-RUN SELECTIVE PATTERN AND ETCH WAFER PROCESS
- Publication number 20040266202
- Publication date Dec 30, 2004
- International Business Machines Corporation
- Kenneth A. Bandy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of photolithographic exposure dose control as a function of...
- Publication number 20040080738
- Publication date Apr 29, 2004
- International Business Machines Corporation
- Keith J. Machia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask/wafer control structure and algorithm for placement
- Publication number 20030196185
- Publication date Oct 16, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of photolithographic exposure dose control as a function of...
- Publication number 20030156267
- Publication date Aug 21, 2003
- International Business Machines Corporation
- Keith J. Machia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for determining overlay tolerance
- Publication number 20030113641
- Publication date Jun 19, 2003
- International Business Machines Corporation
- Robert K. Leidy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Matthew C. Nicholls

Person

Patents Grantslast 30 patents

Overlay and CD process window structure

HDP-based ILD capping layer

HDP-based ILD capping layer

Multi-run selective pattern and etch wafer process

Overlay and CD process window structure

Method of photolithographic exposure dose control as a function of...

Mask/wafer control structure and algorithm for placement

Method and system for determining overlay tolerance

Method of photolithographic exposure dose control as a function of...

Patents Applicationslast 30 patents

IMPROVED HDP-BASED ILD CAPPING LAYER

IMPROVED HDP-BASED ILD CAPPING LAYER

Overlay and CD process window structure

OVERLAY AND CD PROCESS WINDOW STRUCTURE

MULTI-RUN SELECTIVE PATTERN AND ETCH WAFER PROCESS

Method of photolithographic exposure dose control as a function of...

Mask/wafer control structure and algorithm for placement

Method of photolithographic exposure dose control as a function of...

Method and system for determining overlay tolerance