Matthew F. Davis

Person

Brookdale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated substrate defect detection using precision coating
- Patent number 9,859,138
- Issue date Jan 2, 2018
- Lam Research Corporation
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Immersible plasma coil assembly and method for operating the same
- Patent number 9,398,680
- Issue date Jul 19, 2016
- Lam Research Corporation
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for efficient removal of halogen residues from etched sub...
- Patent number 8,486,194
- Issue date Jul 16, 2013
- Applied Materials, Inc.
- Kenneth J. Bhang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus for efficient removal of halogen residues from etched sub...
- Patent number 8,293,016
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Kenneth J. Bahng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for in-situ metrology of a workpiece disposed...
- Patent number 8,274,645
- Issue date Sep 25, 2012
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for monitoring an etch process
- Patent number 8,257,546
- Issue date Sep 4, 2012
- Applied Materials, Inc.
- Matthew Fenton Davis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Within-sequence metrology based process tuning for adaptive self-al...
- Patent number 8,232,212
- Issue date Jul 31, 2012
- Applied Materials, Inc.
- Matthew F. Davis
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Determining endpoint in a substrate process
- Patent number 8,130,382
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for calibrating mass flow controllers
- Patent number 8,089,046
- Issue date Jan 3, 2012
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Advanced process sensing and control using near infrared spectral r...
- Patent number 8,009,938
- Issue date Aug 30, 2011
- Applied Materials, Inc.
- Matthew Fenton Davis
- G01 - MEASURING TESTING
Information Patent Grant
Determining endpoint in a substrate process
- Patent number 7,969,581
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Grant
Substrate temperature measurement by infrared transmission
- Patent number 7,946,759
- Issue date May 24, 2011
- Applied Materials, Inc.
- Matthew Fenton Davis
- G01 - MEASURING TESTING
Information Patent Grant
Integrated method for removal of halogen residues from etched subst...
- Patent number 7,846,845
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Kenneth J. Bahng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for removing a halogen-containing residue
- Patent number 7,846,347
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Mark N. Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a process for fabricating integrated devices
- Patent number 7,815,812
- Issue date Oct 19, 2010
- Applied Materials, Inc.
- Matthew F. Davis
- G05 - CONTROLLING REGULATING
Information Patent Grant
Determining endpoint in a substrate process
- Patent number 7,808,651
- Issue date Oct 5, 2010
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Grant
Method for automatic determination of semiconductor plasma chamber...
- Patent number 7,695,987
- Issue date Apr 13, 2010
- Applied Materils, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Interferometric endpoint determination in a substrate etching process
- Patent number 7,652,774
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for performing limited area spectral analysis
- Patent number 7,602,484
- Issue date Oct 13, 2009
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Method for automatic determination of substrates states in plasma p...
- Patent number 7,393,459
- Issue date Jul 1, 2008
- Applied Materials, Inc.
- Matthew F Davis
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for removing a halogen-containing residue
- Patent number 7,374,696
- Issue date May 20, 2008
- Applied Materials, Inc.
- Mark N. Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for performing limited area spectral analysis
- Patent number 7,330,244
- Issue date Feb 12, 2008
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Interferometric endpoint determination in a substrate etching process
- Patent number 7,306,696
- Issue date Dec 11, 2007
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Grant
Method for automatic determination of semiconductor plasma chamber...
- Patent number 7,169,625
- Issue date Jan 30, 2007
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for performing limited area spectral analysis
- Patent number 7,158,221
- Issue date Jan 2, 2007
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Grant
Variable efficiency faraday shield
- Patent number 6,685,799
- Issue date Feb 3, 2004
- Applied Materials Inc.
- Matthew F. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing contamination in a wafer loadlock...
- Patent number 6,410,889
- Issue date Jun 25, 2002
- Applied Materials, Inc.
- Matthew F. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for reducing contamination in a wafer loadlock...
- Patent number 6,323,463
- Issue date Nov 27, 2001
- Applied Materials, Inc.
- Matthew F. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING
- Publication number 20180166307
- Publication date Jun 14, 2018
- LAM RESEARCH CORPORATION
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING
- Publication number 20160111307
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUB...
- Publication number 20130040080
- Publication date Feb 14, 2013
- Kenneth J. Bhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING AN ETCH PROCESS
- Publication number 20120291952
- Publication date Nov 22, 2012
- Matthew Fenton Davis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersible Plasma Coil Assembly and Method for Operating the Same
- Publication number 20120138450
- Publication date Jun 7, 2012
- LAM RESEARCH CORPORATION
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETERMINING ENDPOINT IN A SUBSTRATE PROCESS
- Publication number 20110253671
- Publication date Oct 20, 2011
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING ENDPOINT IN A SUBSTRATE PROCESS
- Publication number 20110019201
- Publication date Jan 27, 2011
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR IN-SITU METROLOGY OF A WORKPIECE DISPOSED...
- Publication number 20110013175
- Publication date Jan 20, 2011
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
ENDPOINT DETECTION FOR A REACTOR CHAMBER USING A REMOTE PLASMA CHAMBER
- Publication number 20100224322
- Publication date Sep 9, 2010
- Applied Materials, Inc.
- ZHIFENG SUI
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING ENDPOINT IN A SUBSTRATE PROCESS
- Publication number 20100133232
- Publication date Jun 3, 2010
- Applied Materials, Inc.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUB...
- Publication number 20100133255
- Publication date Jun 3, 2010
- Applied Materials, Inc.
- Kenneth J. Bahng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-DIAGNOSTIC SEMICONDUCTOR EQUIPMENT
- Publication number 20100076729
- Publication date Mar 25, 2010
- Applied Materials, Inc.
- MATTHEW F. DAVIS
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING MASS FLOW CONTROLLERS
- Publication number 20100071438
- Publication date Mar 25, 2010
- Applied Materials, Inc.
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
WITHIN-SEQUENCE METROLOGY BASED PROCESS TUNING FOR ADAPTIVE SELF-AL...
- Publication number 20100009470
- Publication date Jan 14, 2010
- APPLIED MATERIALS, INC.
- Matthew F. Davis
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION IN AN ET...
- Publication number 20090316749
- Publication date Dec 24, 2009
- Matthew Fenton Davis
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED PROCESS SENSING AND CONTROL USING NEAR INFRARED SPECTRAL R...
- Publication number 20090218314
- Publication date Sep 3, 2009
- APPLIED MATERIALS, INC.
- Matthew Fenton Davis
- G02 - OPTICS
Information Patent Application
IMPLEMENTATION OF ADVANCED ENDPOINT FUNCTIONS WITHIN THIRD PARTY SO...
- Publication number 20090158265
- Publication date Jun 18, 2009
- Matthew Fenton Davis
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION
- Publication number 20080198895
- Publication date Aug 21, 2008
- MATTHEW FENTON DAVIS
- G01 - MEASURING TESTING
Information Patent Application
Interferometric endpoint determination in a substrate etching process
- Publication number 20080151237
- Publication date Jun 26, 2008
- APPLIED MATERIALS, INC.
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBST...
- Publication number 20080099040
- Publication date May 1, 2008
- Kenneth J. Bahng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS
- Publication number 20080074658
- Publication date Mar 27, 2008
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR REMOVING A HALOGEN-CONTAINING RESIDUE
- Publication number 20070272359
- Publication date Nov 29, 2007
- Applied Materials, Inc.
- MARK N. KAWAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING A HALOGEN-CONTAINING RESIDUE
- Publication number 20070254489
- Publication date Nov 1, 2007
- Applied Materials, Inc.
- MARK N. KAWAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Neural Network Methods and Apparatuses for Monitoring Substrate Pro...
- Publication number 20070249071
- Publication date Oct 25, 2007
- Lei Lian
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS
- Publication number 20070153263
- Publication date Jul 5, 2007
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR AUTOMATIC DETERMINATION OF SEMICONDUCTOR PLASMA CHAMBER...
- Publication number 20070095789
- Publication date May 3, 2007
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CONTROLLING A PROCESS FOR FABRICATING INTEGRATED DEVICES
- Publication number 20070017896
- Publication date Jan 25, 2007
- Applied Materials, Inc.
- Matthew F. Davis
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for automatic determination of substrates states in plasma p...
- Publication number 20060028646
- Publication date Feb 9, 2006
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for performing limited area spectral analysis
- Publication number 20050134834
- Publication date Jun 23, 2005
- Matthew F. Davis
- G01 - MEASURING TESTING
Information Patent Application
Method for automatic determination of semiconductor plasma chamber...
- Publication number 20050019961
- Publication date Jan 27, 2005
- APPLIED MATERIALS, INC.
- Matthew F. Davis
- G01 - MEASURING TESTING

Matthew F. Davis

Person

Patents Grantslast 30 patents

Integrated substrate defect detection using precision coating

Immersible plasma coil assembly and method for operating the same

Apparatus for efficient removal of halogen residues from etched sub...

Apparatus for efficient removal of halogen residues from etched sub...

Method and apparatus for in-situ metrology of a workpiece disposed...

Method and system for monitoring an etch process

Within-sequence metrology based process tuning for adaptive self-al...

Determining endpoint in a substrate process

Method and apparatus for calibrating mass flow controllers

Advanced process sensing and control using near infrared spectral r...

Determining endpoint in a substrate process

Substrate temperature measurement by infrared transmission

Integrated method for removal of halogen residues from etched subst...

Method for removing a halogen-containing residue

Method for controlling a process for fabricating integrated devices

Determining endpoint in a substrate process

Method for automatic determination of semiconductor plasma chamber...

Interferometric endpoint determination in a substrate etching process

Method and apparatus for performing limited area spectral analysis

Method for automatic determination of substrates states in plasma p...

Method and apparatus for removing a halogen-containing residue

Method and apparatus for performing limited area spectral analysis

Interferometric endpoint determination in a substrate etching process

Method for automatic determination of semiconductor plasma chamber...

Method and apparatus for performing limited area spectral analysis

Variable efficiency faraday shield

Method and apparatus for reducing contamination in a wafer loadlock...

Method and apparatus for reducing contamination in a wafer loadlock...

Patents Applicationslast 30 patents

INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING

INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING

APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUB...

METHOD AND SYSTEM FOR MONITORING AN ETCH PROCESS

Immersible Plasma Coil Assembly and Method for Operating the Same

DETERMINING ENDPOINT IN A SUBSTRATE PROCESS

DETERMINING ENDPOINT IN A SUBSTRATE PROCESS

METHOD AND APPARATUS FOR IN-SITU METROLOGY OF A WORKPIECE DISPOSED...

ENDPOINT DETECTION FOR A REACTOR CHAMBER USING A REMOTE PLASMA CHAMBER

DETERMINING ENDPOINT IN A SUBSTRATE PROCESS

APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUB...

SELF-DIAGNOSTIC SEMICONDUCTOR EQUIPMENT

METHOD AND APPARATUS FOR CALIBRATING MASS FLOW CONTROLLERS

WITHIN-SEQUENCE METROLOGY BASED PROCESS TUNING FOR ADAPTIVE SELF-AL...

SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION IN AN ET...

ADVANCED PROCESS SENSING AND CONTROL USING NEAR INFRARED SPECTRAL R...

IMPLEMENTATION OF ADVANCED ENDPOINT FUNCTIONS WITHIN THIRD PARTY SO...

SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION

Interferometric endpoint determination in a substrate etching process

INTEGRATED METHOD FOR REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBST...

METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS

APPARATUS FOR REMOVING A HALOGEN-CONTAINING RESIDUE

METHOD FOR REMOVING A HALOGEN-CONTAINING RESIDUE

Neural Network Methods and Apparatuses for Monitoring Substrate Pro...

METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS

METHOD FOR AUTOMATIC DETERMINATION OF SEMICONDUCTOR PLASMA CHAMBER...

METHOD FOR CONTROLLING A PROCESS FOR FABRICATING INTEGRATED DEVICES

Method for automatic determination of substrates states in plasma p...

Method and apparatus for performing limited area spectral analysis

Method for automatic determination of semiconductor plasma chamber...