Matthew Goeckner

Person

Plano, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,528,805
- Issue date Mar 4, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low voltage plasma doping using dual pulses
- Patent number 6,527,918
- Issue date Mar 4, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode for plasma doping system
- Patent number 6,500,496
- Issue date Dec 31, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for eliminating displacement current from curr...
- Patent number 6,433,553
- Issue date Aug 13, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for low voltage plasma doping using dual pulses
- Patent number 6,335,536
- Issue date Jan 1, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,300,643
- Issue date Oct 9, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode for plasma doping system
- Patent number 6,182,604
- Issue date Feb 6, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,020,592
- Issue date Feb 1, 2000
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electron beam exciter for use in chemical analysis in processing sy...
- Publication number 20100032587
- Publication date Feb 11, 2010
- Jimmy W. Hosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for low voltage plasma doping using dual pulses
- Publication number 20020066668
- Publication date Jun 6, 2002
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose monitor for plasma doping system
- Publication number 20020030167
- Publication date Mar 14, 2002
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose monitor for plasma doping system
- Publication number 20010042827
- Publication date Nov 22, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS

Matthew Goeckner

Person

Patents Grantslast 30 patents

Dose monitor for plasma doping system

Method and apparatus for low voltage plasma doping using dual pulses

Hollow cathode for plasma doping system

Method and apparatus for eliminating displacement current from curr...

Method and apparatus for low voltage plasma doping using dual pulses

Dose monitor for plasma doping system

Hollow cathode for plasma doping system

Dose monitor for plasma doping system

Patents Applicationslast 30 patents

Electron beam exciter for use in chemical analysis in processing sy...

Method and apparatus for low voltage plasma doping using dual pulses

Dose monitor for plasma doping system

Dose monitor for plasma doping system