Matthew Graham

Person

Escondido, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,085,862
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Matthew Ryan Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for and method of source material delivery in a laser pro...
- Patent number 10,681,795
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alexander Igorevich Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of source material delivery in a laser pro...
- Patent number 10,237,960
- Issue date Mar 19, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring system for an optical lithography system
- Patent number 10,234,769
- Issue date Mar 19, 2019
- Cymer, LLC
- Andrei Dorobantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment of light source focus
- Patent number 9,832,853
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for and method of source material delivery in a laser pro...
- Patent number 9,795,023
- Issue date Oct 17, 2017
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV LPP source with improved dose control by combining pulse modula...
- Patent number 9,755,396
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Paul Frihauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method to adaptively pre-compensate for target material...
- Patent number 9,588,430
- Issue date Mar 7, 2017
- ASML Netherlands B.V.
- Jeroen van der Burgt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to reduce oscillations in extreme ultraviolet lig...
- Patent number 9,363,877
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for and method of source material delivery in a laser pro...
- Patent number 9,301,382
- Issue date Mar 29, 2016
- ASML Netherlands B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method to adaptively pre-compensate for target material...
- Patent number 9,238,243
- Issue date Jan 19, 2016
- ASML Netherlands B.V.
- Jeroen van der Burgt
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
System and method for return beam metrology with optical switch
- Patent number 9,127,981
- Issue date Sep 8, 2015
- Cymer, LLC
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for adjusting seed laser pulse width to control E...
- Patent number 9,000,403
- Issue date Apr 7, 2015
- ASML Netherlands B.V.
- James Crouch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Energy sensors for light beam alignment
- Patent number 8,993,976
- Issue date Mar 31, 2015
- ASML Netherlands B.V.
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of timing laser beam pulses to regulate extreme ultraviolet...
- Patent number 8,872,122
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- Alexander Schafgans
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of timing laser beam pulses to regulate extreme ultraviolet...
- Patent number 8,872,123
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- James Crouch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Alignment of light source focus
- Patent number 8,648,999
- Issue date Feb 11, 2014
- Cymer, LLC
- Matthew R. Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method to optimize extreme ultraviolet light generation
- Patent number 8,598,552
- Issue date Dec 3, 2013
- Cymer, Inc.
- Paul Frihauf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for compensating for thermal effects in an EUV li...
- Patent number 8,368,041
- Issue date Feb 5, 2013
- Cymer, Inc.
- Matthew R. Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for managing light source operation
- Patent number 8,295,316
- Issue date Oct 23, 2012
- Cymer, Inc.
- Robert P. Akins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
- Publication number 20220317576
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Matthew Ryan Graham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...
- Publication number 20190200442
- Publication date Jun 27, 2019
- ASML NETHERLANDS B.V.
- Alexander Igorevich ERSHOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MONITORING SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM
- Publication number 20180335701
- Publication date Nov 22, 2018
- CYMER, LLC
- Andrei Dorobantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...
- Publication number 20180027642
- Publication date Jan 25, 2018
- ASML NETHERLANDS B.V.
- Alexander I Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method to Adaptively Pre-Compensate for Target Material...
- Publication number 20160202614
- Publication date Jul 14, 2016
- ASML NETHERLANDS B.V.
- Jeroen van der Burgt
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...
- Publication number 20160174352
- Publication date Jun 16, 2016
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD TO REDUCE OSCILLATIONS IN EXTREME ULTRAVIOLET LIG...
- Publication number 20160044772
- Publication date Feb 11, 2016
- ASML NETHERLANDS B.V.
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...
- Publication number 20150156855
- Publication date Jun 4, 2015
- Cymer LLC
- Alexander I. ERSHOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Return Beam Metrology with Optical Switch
- Publication number 20150041659
- Publication date Feb 12, 2015
- CYMER, LLC
- Matthew Graham
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Adjusting Seed Laser Pulse Width to Control E...
- Publication number 20140233005
- Publication date Aug 21, 2014
- Cymer, Inc.
- James Crouch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...
- Publication number 20140191133
- Publication date Jul 10, 2014
- Cymer, Inc.
- James Crouch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...
- Publication number 20140191132
- Publication date Jul 10, 2014
- Cymer, Inc.
- Alexander Schafgans
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ALIGNMENT OF LIGHT SOURCE FOCUS
- Publication number 20140151583
- Publication date Jun 5, 2014
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Application
System and Method to Adaptively Pre-Compensate for Target Material...
- Publication number 20140091239
- Publication date Apr 3, 2014
- Jeroen van der Burgt
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
System and Method To Optimize Extreme Ultraviolet Light Generation
- Publication number 20130320244
- Publication date Dec 5, 2013
- Cymer, Inc.
- Paul Frihauf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Energy Sensors for Light Beam Alignment
- Publication number 20130043401
- Publication date Feb 21, 2013
- Cymer, Inc.
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LI...
- Publication number 20120248341
- Publication date Oct 4, 2012
- Matthew R. Graham
- G02 - OPTICS
Information Patent Application
ALIGNMENT OF LIGHT SOURCE FOCUS
- Publication number 20120019826
- Publication date Jan 26, 2012
- Cymer, Inc.
- Matthew R. Graham
- G01 - MEASURING TESTING
Information Patent Application
Method and System for Managing Light Source Operation
- Publication number 20110235663
- Publication date Sep 29, 2011
- Robert P. Akins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Matthew Graham

Person

Patents Grantslast 30 patents

Laser system for source material conditioning in an EUV light source

Apparatus for and method of source material delivery in a laser pro...

Apparatus for and method of source material delivery in a laser pro...

Monitoring system for an optical lithography system

Alignment of light source focus

Apparatus for and method of source material delivery in a laser pro...

EUV LPP source with improved dose control by combining pulse modula...

System and method to adaptively pre-compensate for target material...

System and method to reduce oscillations in extreme ultraviolet lig...

Apparatus for and method of source material delivery in a laser pro...

System and method to adaptively pre-compensate for target material...

System and method for return beam metrology with optical switch

System and method for adjusting seed laser pulse width to control E...

Energy sensors for light beam alignment

Method of timing laser beam pulses to regulate extreme ultraviolet...

Method of timing laser beam pulses to regulate extreme ultraviolet...

Alignment of light source focus

System and method to optimize extreme ultraviolet light generation

System and method for compensating for thermal effects in an EUV li...

Method and system for managing light source operation

Patents Applicationslast 30 patents

LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE

APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...

MONITORING SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM

APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...

System and Method to Adaptively Pre-Compensate for Target Material...

APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...

SYSTEM AND METHOD TO REDUCE OSCILLATIONS IN EXTREME ULTRAVIOLET LIG...

APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRO...

System and Method for Return Beam Metrology with Optical Switch

System and Method for Adjusting Seed Laser Pulse Width to Control E...

Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...

Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...

ALIGNMENT OF LIGHT SOURCE FOCUS

System and Method to Adaptively Pre-Compensate for Target Material...

System and Method To Optimize Extreme Ultraviolet Light Generation

Energy Sensors for Light Beam Alignment

SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LI...

ALIGNMENT OF LIGHT SOURCE FOCUS

Method and System for Managing Light Source Operation