Matthew L. Miller

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 10,283,321
- Issue date May 7, 2019
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 9,144,147
- Issue date Sep 22, 2015
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 8,894,767
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source design
- Patent number 8,771,538
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source design
- Patent number 8,742,665
- Issue date Jun 3, 2014
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film growth with radicals produced using flexible nitrog...
- Patent number 8,629,067
- Issue date Jan 14, 2014
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with plasma load impedance tuning for engineered tra...
- Patent number 8,357,264
- Issue date Jan 22, 2013
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with plasma load impedance tuning for engineered tra...
- Patent number 8,337,661
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film formation using inert gas excitation
- Patent number 8,329,262
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Matthew L. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of plasma load impedance tuning for engineered transients by...
- Patent number 8,324,525
- Issue date Dec 4, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Etching chamber having flow equalizer and lower liner
- Patent number 8,313,578
- Issue date Nov 20, 2012
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 8,237,517
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Gas flow diffuser
- Patent number 8,123,902
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Paul Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with high speed plasma load impedance tuning by modu...
- Patent number 8,018,164
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of plasma load impedance tuning for engineered transients by...
- Patent number 8,002,945
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 7,994,872
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of plasma load impedance tuning by modulation of an unmatche...
- Patent number 7,967,944
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma reactor with magnetic plasma control
- Patent number 7,955,986
- Issue date Jun 7, 2011
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma confinement for enhancing magnetic control of plas...
- Patent number 7,780,866
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Matthew L. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling characteristics of a plasma
- Patent number 7,777,599
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,186,943
- Issue date Mar 6, 2007
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,132,618
- Issue date Nov 7, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
- Patent number 7,030,335
- Issue date Apr 18, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-ZONE LAMP HEATING FOR CHEMICAL VAPOR DEPOSITION
- Publication number 20230352322
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT POWER TRANSMISSION COMPONENTS
- Publication number 20220122817
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Paul L. Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20150013793
- Publication date Jan 15, 2015
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20130153148
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20130082197
- Publication date Apr 4, 2013
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20120180954
- Publication date Jul 19, 2012
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20110291771
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL
- Publication number 20110201134
- Publication date Aug 18, 2011
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC FILM FORMATION USING INERT GAS EXCITATION
- Publication number 20110165347
- Publication date Jul 7, 2011
- Applied Materials, Inc.
- Matthew L. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRIC FILM GROWTH WITH RADICALS PRODUCED USING FLEXIBLE NITROG...
- Publication number 20110159703
- Publication date Jun 30, 2011
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE DESIGN
- Publication number 20110115378
- Publication date May 19, 2011
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE DESIGN
- Publication number 20110114601
- Publication date May 19, 2011
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20110011338
- Publication date Jan 20, 2011
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS
- Publication number 20100098882
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER
- Publication number 20100065213
- Publication date Mar 18, 2010
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20100013572
- Publication date Jan 21, 2010
- Applied Materials, Inc.
- STEVEN C. SHANNON
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF A SOURCE PO...
- Publication number 20090294275
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH HIGH SPEED PLASMA LOAD IMPEDANCE TUNING BY MODU...
- Publication number 20090295295
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...
- Publication number 20090294062
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...
- Publication number 20090298287
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF AN UNMATCHE...
- Publication number 20090295296
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR WITH HIGH SPEED PLASMA IMPEDANCE TUNING BY MODULATIO...
- Publication number 20090297404
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...
- Publication number 20090294061
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FLOW DIFFUSER
- Publication number 20080230518
- Publication date Sep 25, 2008
- APPLIED MATERIALS, INC.
- Paul Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...
- Publication number 20080182417
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...
- Publication number 20080182418
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...
- Publication number 20080180028
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...
- Publication number 20080179181
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...
- Publication number 20080182416
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS

Matthew L. Miller

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Flow control features of CVD chambers

Semiconductor processing system and methods using capacitively coup...

Semiconductor processing system and methods using capacitively coup...

Flow control features of CVD chambers

Plasma source design

Plasma source design

Dielectric film growth with radicals produced using flexible nitrog...

Plasma reactor with plasma load impedance tuning for engineered tra...

Plasma reactor with plasma load impedance tuning for engineered tra...

Dielectric film formation using inert gas excitation

Method of plasma load impedance tuning for engineered transients by...

Etching chamber having flow equalizer and lower liner

Apparatus for multiple frequency power application

Gas flow diffuser

Plasma process uniformity across a wafer by controlling a variable...

Plasma process uniformity across a wafer by controlling RF phase be...

Plasma reactor with high speed plasma load impedance tuning by modu...

Method of plasma load impedance tuning for engineered transients by...

Apparatus for multiple frequency power application

Method of plasma load impedance tuning by modulation of an unmatche...

Method of processing a workpiece in a plasma reactor with variable...

Capacitively coupled plasma reactor with magnetic plasma control

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Method of plasma confinement for enhancing magnetic control of plas...

Methods and apparatus for controlling characteristics of a plasma

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

Plasma reactor with overhead RF electrode tuned to the plasma with...

Patents Applicationslast 30 patents

MULTI-ZONE LAMP HEATING FOR CHEMICAL VAPOR DEPOSITION

SEMICONDUCTOR SUBSTRATE SUPPORT POWER TRANSMISSION COMPONENTS

FLOW CONTROL FEATURES OF CVD CHAMBERS

FLOW CONTROL FEATURES OF CVD CHAMBERS

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL

DIELECTRIC FILM FORMATION USING INERT GAS EXCITATION

DIELECTRIC FILM GROWTH WITH RADICALS PRODUCED USING FLEXIBLE NITROG...

PLASMA SOURCE DESIGN

PLASMA SOURCE DESIGN

FLOW CONTROL FEATURES OF CVD CHAMBERS

PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS

ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF A SOURCE PO...

PLASMA REACTOR WITH HIGH SPEED PLASMA LOAD IMPEDANCE TUNING BY MODU...

PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...

METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY...

METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF AN UNMATCHE...

PLASMA REACTOR WITH HIGH SPEED PLASMA IMPEDANCE TUNING BY MODULATIO...

PLASMA REACTOR WITH PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRA...

GAS FLOW DIFFUSER

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...

METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...