Matthew R. Gadinski

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Heterogeneous fluoropolymer mixture polishing pad
- Patent number 11,897,082
- Issue date Feb 13, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Cationic fluoropolymer composite polishing pad
- Patent number 11,712,777
- Issue date Aug 1, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Low-debris fluopolymer composite CMP polishing pad
- Patent number 11,638,978
- Issue date May 2, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing pad with uniform window
- Patent number 11,633,830
- Issue date Apr 25, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING
Information Patent Grant
Cationic fluoropolymer composite polishing method
- Patent number 11,577,360
- Issue date Feb 14, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compressible non-reticulated polyurea polishing pad
- Patent number 11,548,114
- Issue date Jan 10, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluopolymer composite CMP polishing method
- Patent number 11,491,605
- Issue date Nov 8, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multipurpose composite window
- Patent number 11,325,221
- Issue date May 10, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Thin film fluoropolymer composite CMP polishing method
- Patent number 11,285,577
- Issue date Mar 29, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pad with pad wear indicator
- Patent number 11,192,215
- Issue date Dec 7, 2021
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,569,384
- Issue date Feb 25, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Aliphatic UV cured polyurethane optical endpoint detection windows...
- Patent number 10,465,097
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,464,188
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH FLUORINATED POLYMER AND MULT...
- Publication number 20240207998
- Publication date Jun 27, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
PAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230347470
- Publication date Nov 2, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
HETEROGENEOUS FLUOROPOLYMER MIXTURE POLISHING PAD
- Publication number 20230078023
- Publication date Mar 16, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED POLYUREA COPOLYMER PAD
- Publication number 20230082181
- Publication date Mar 16, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD WITH WINDOW HAVING TRANSPARENCY AT LOW WAVELENGTH...
- Publication number 20220203495
- Publication date Jun 30, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD WITH UNIFORM WINDOW
- Publication number 20210402556
- Publication date Dec 30, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING
Information Patent Application
THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384601
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- B24 - GRINDING POLISHING
Information Patent Application
CATIONIC FLUOROPOLYMER COMPOSITE POLISHING PAD
- Publication number 20200384604
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384603
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384600
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384602
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CATIONIC FLUOROPOLYMER COMPOSITE POLISHING METHOD
- Publication number 20200384605
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD WITH MULTIPURPOSE COMPOSITE WINDOW
- Publication number 20190232459
- Publication date Aug 1, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD WITH PAD WEAR INDICATOR
- Publication number 20190224811
- Publication date Jul 25, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING
Information Patent Application
ALIPHATIC UV CURED POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS...
- Publication number 20190144713
- Publication date May 16, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Matthew R. Gadinski

Person

Patents Grantslast 30 patents

Heterogeneous fluoropolymer mixture polishing pad

Cationic fluoropolymer composite polishing pad

Low-debris fluopolymer composite CMP polishing pad

CMP polishing pad with uniform window

Cationic fluoropolymer composite polishing method

Compressible non-reticulated polyurea polishing pad

Fluopolymer composite CMP polishing method

Polishing pad with multipurpose composite window

Thin film fluoropolymer composite CMP polishing method

Polishing pad with pad wear indicator

Chemical mechanical polishing pad and polishing method

Aliphatic UV cured polyurethane optical endpoint detection windows...

Chemical mechanical polishing pad and polishing method

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING PAD WITH FLUORINATED POLYMER AND MULT...

PAD FOR CHEMICAL MECHANICAL POLISHING

HETEROGENEOUS FLUOROPOLYMER MIXTURE POLISHING PAD

FLUORINATED POLYUREA COPOLYMER PAD

CMP POLISHING PAD WITH WINDOW HAVING TRANSPARENCY AT LOW WAVELENGTH...

CMP POLISHING PAD WITH UNIFORM WINDOW

THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD

CATIONIC FLUOROPOLYMER COMPOSITE POLISHING PAD

LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD

THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

CATIONIC FLUOROPOLYMER COMPOSITE POLISHING METHOD

POLISHING PAD WITH MULTIPURPOSE COMPOSITE WINDOW

POLISHING PAD WITH PAD WEAR INDICATOR

ALIPHATIC UV CURED POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS...