Matthew Richard Van Hanehem

Person

Middletown, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of selective chemical mechanical polishing cobalt, zirconium...
- Patent number 11,292,938
- Issue date Apr 5, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Murali Ganth Theivanayagam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition and method of polishing s...
- Patent number 10,954,411
- Issue date Mar 23, 2021
- Rohm and Haas Electronic Materials CMP Holdings
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous compositions of low dishing silica particles for polysilico...
- Patent number 10,822,524
- Issue date Nov 3, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing compositions and methods having enhan...
- Patent number 10,787,592
- Issue date Sep 29, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- Naresh Kumar Penta
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing compositions and methods for suppress...
- Patent number 10,626,298
- Issue date Apr 21, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous silica slurry and amine carboxylic acid compositions select...
- Patent number 10,584,265
- Issue date Mar 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing method for cobalt
- Patent number 10,377,921
- Issue date Aug 13, 2019
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Murali G. Theivanayagam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous silica slurry compositions for use in shallow trench isolat...
- Patent number 10,316,218
- Issue date Jun 11, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous silica slurry compositions for use in shallow trench isolat...
- Patent number 10,221,336
- Issue date Mar 5, 2019
- rohm and Hass Electronic Materials CMP Holdings, Inc.
- Julia Kozhukh
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method for cobalt
- Patent number 10,170,335
- Issue date Jan 1, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Murali G. Theivanayagam
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous compositions of low abrasive silica particles
- Patent number 9,783,702
- Issue date Oct 10, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing a substrate
- Patent number 9,102,034
- Issue date Aug 11, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Michelle Jensen
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD
- Publication number 20220348790
- Publication date Nov 3, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Changzai Chi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...
- Publication number 20210071034
- Publication date Mar 11, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Murali Ganth Theivanayagam
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING S...
- Publication number 20200362198
- Publication date Nov 19, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...
- Publication number 20190185714
- Publication date Jun 20, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...
- Publication number 20190092972
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHOD FOR COBALT
- Publication number 20190085206
- Publication date Mar 21, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Murali G. Theivanayagam
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...
- Publication number 20190062593
- Publication date Feb 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...
- Publication number 20180362805
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Julia Kozhukh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20150065013
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE
- Publication number 20150065014
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING

Matthew Richard Van Hanehem

Person

Patents Grantslast 30 patents

Method of selective chemical mechanical polishing cobalt, zirconium...

Chemical mechanical polishing composition and method of polishing s...

Aqueous compositions of low dishing silica particles for polysilico...

Chemical mechanical polishing compositions and methods having enhan...

Chemical mechanical polishing compositions and methods for suppress...

Aqueous silica slurry and amine carboxylic acid compositions select...

Chemical mechanical polishing method for cobalt

Aqueous silica slurry compositions for use in shallow trench isolat...

Aqueous silica slurry compositions for use in shallow trench isolat...

Chemical mechanical polishing method for cobalt

Aqueous compositions of low abrasive silica particles

Method of chemical mechanical polishing a substrate

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD

METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING S...

AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...

AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...

CHEMICAL MECHANICAL POLISHING METHOD FOR COBALT

AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...

AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLAT...

CHEMICAL MECHANICAL POLISHING PAD

METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE