Matthew Scott Weimer

Person

Chicago, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Depositing a carbon hardmask by high power pulsed low frequency RF
- Patent number 11,837,441
- Issue date Dec 5, 2023
- Lam Research Corporation
- Matthew Scott Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma based deposition of boron nitride, boron carbide, and...
- Patent number 10,840,087
- Issue date Nov 17, 2020
- Lam Research Corporation
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RADICAL-ACTIVATED CARBON FILM DEPOSITION
- Publication number 20240282570
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
- Publication number 20240234091
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
- Publication number 20240136153
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROBUST ASHABLE HARD MASK
- Publication number 20230360922
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Matthew Scott WEIMER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION RATE ENHANCEMENT OF AMORPHOUS CARBON HARD MASK FILM BY P...
- Publication number 20230357921
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...
- Publication number 20230203646
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Matthew Scott WEIMER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY, MODULUS, AND HARDNESS AMORPHOUS CARBON FILMS AT LOW P...
- Publication number 20220282366
- Publication date Sep 8, 2022
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN DIAMOND-LIKE CARBON...
- Publication number 20220216037
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA BASED DEPOSITION OF BORON NITRIDE, BORON CARBIDE, AND...
- Publication number 20200027725
- Publication date Jan 23, 2020
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...
- Publication number 20180347035
- Publication date Dec 6, 2018
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA BASED DEPOSITION OF SILICON CARBIDE FILMS USING SILIC...
- Publication number 20180330945
- Publication date Nov 15, 2018
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS

Matthew Scott Weimer

Person

Patents Grantslast 30 patents

Depositing a carbon hardmask by high power pulsed low frequency RF

Remote plasma based deposition of boron nitride, boron carbide, and...

Patents Applicationslast 30 patents

RADICAL-ACTIVATED CARBON FILM DEPOSITION

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

ROBUST ASHABLE HARD MASK

DEPOSITION RATE ENHANCEMENT OF AMORPHOUS CARBON HARD MASK FILM BY P...

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...

HIGH DENSITY, MODULUS, AND HARDNESS AMORPHOUS CARBON FILMS AT LOW P...

HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN DIAMOND-LIKE CARBON...

REMOTE PLASMA BASED DEPOSITION OF BORON NITRIDE, BORON CARBIDE, AND...

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...

REMOTE PLASMA BASED DEPOSITION OF SILICON CARBIDE FILMS USING SILIC...