Matthew Sendelbach

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for optical characterization of patterned samples
- Patent number 11,885,737
- Issue date Jan 30, 2024
- Nova Ltd.
- Dror Shafir
- G01 - MEASURING TESTING
Information Patent Grant
TEM-based metrology method and system
- Patent number 11,710,616
- Issue date Jul 25, 2023
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and system
- Patent number 11,450,541
- Issue date Sep 20, 2022
- Nova Ltd.
- Vladimir Machavariani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TEM-based metrology method and system
- Patent number 11,309,162
- Issue date Apr 19, 2022
- Nova Ltd.
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process control of semiconductor fabrication based on spectra quali...
- Patent number 11,300,948
- Issue date Apr 12, 2022
- Nova Ltd.
- Taher Kagalwala
- G05 - CONTROLLING REGULATING
Information Patent Grant
TEM-based metrology method and system
- Patent number 10,916,404
- Issue date Feb 9, 2021
- Nova Measuring Instruments Ltd.
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for optical characterization of patterned samples
- Patent number 10,876,959
- Issue date Dec 29, 2020
- Nova Measuring Instruments Ltd.
- Dror Shafir
- G01 - MEASURING TESTING
Information Patent Grant
Measuring complex structures in semiconductor fabrication
- Patent number 10,664,638
- Issue date May 26, 2020
- GLOBALFOUNDRIES Inc.
- Taher Kagalwala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scatterometry method and system
- Patent number 10,302,414
- Issue date May 28, 2019
- Nova Measuring Instruments Ltd.
- Gilad Wainreb
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for planning metrology measurements
- Patent number 10,222,710
- Issue date Mar 5, 2019
- Nova Measuring Instruments Ltd.
- Matthew Sendelbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining strain distribution in a sample
- Patent number 10,209,206
- Issue date Feb 19, 2019
- Nova Measuring Instruments Ltd.
- Gilad Barak
- G01 - MEASURING TESTING
Information Patent Grant
Automated hybrid metrology for semiconductor device fabrication
- Patent number 9,330,985
- Issue date May 3, 2016
- GLOBALFOUNDRIES, INC.
- Alok Vaid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching system and method for forming multiple porous semiconductor...
- Patent number 8,157,978
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Matthew J. Sendelbach
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Optical measurement using fixed polarizer
- Patent number 7,791,723
- Issue date Sep 7, 2010
- International Business Machines Corporation
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring a photolithographic process using a scatterometry target
- Patent number 7,760,360
- Issue date Jul 20, 2010
- International Business Machines Corporation
- Charles N. Archie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment and optimization for metrology instrument including unce...
- Patent number 7,453,583
- Issue date Nov 18, 2008
- International Business Machines Corporation
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Grant
Assessment and optimization for metrology instrument including unce...
- Patent number 7,286,247
- Issue date Oct 23, 2007
- International Business Machines Corporation
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Grant
Fortified, compensated and uncompensated process-sensitive scattero...
- Patent number 7,265,850
- Issue date Sep 4, 2007
- International Business Machines Corporation
- Charles N. Archie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combining multiple reference measurement collections into a weighte...
- Patent number 7,107,177
- Issue date Sep 12, 2006
- International Business Machines Corporation
- Matthew J. Sendelbach
- G01 - MEASURING TESTING
Information Patent Grant
Method for planarizing photoresist
- Patent number 6,361,402
- Issue date Mar 26, 2002
- International Business Machines Corporation
- Donald F. Canaperi
- B24 - GRINDING POLISHING
Information Patent Grant
High selectivity collar oxide etch processes
- Patent number 6,066,566
- Issue date May 23, 2000
- International Business Machines Corporation
- Munir-ud-Din Naeem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization of a non-conformal device layer in semiconductor fabr...
- Patent number 6,001,740
- Issue date Dec 14, 1999
- Siemens Aktiengesellschaft
- Kathryn H. Varian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for protecting device components from chemical mechanical p...
- Patent number 5,976,982
- Issue date Nov 2, 1999
- Siemens Aktiengesellschaft
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization of a non-conformal device layer in semiconductor fabr...
- Patent number 5,880,007
- Issue date Mar 9, 1999
- Siemens Aktiengesellschaft
- Kathryn H. Varian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of etching an oxide layer
- Patent number 5,811,357
- Issue date Sep 22, 1998
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
- Publication number 20240337590
- Publication date Oct 10, 2024
- NOVA LTD
- Dror SHAFIR
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND SYSTEM
- Publication number 20230074398
- Publication date Mar 9, 2023
- NOVA LTD
- VLADIMIR MACHAVARIANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20220310356
- Publication date Sep 29, 2022
- NOVA LTD
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20210217581
- Publication date Jul 15, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
- Publication number 20210116359
- Publication date Apr 22, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- Dror SHAFIR
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...
- Publication number 20200409345
- Publication date Dec 31, 2020
- GLOBALFOUNDRIES INC.
- TAHER KAGALWALA
- G05 - CONTROLLING REGULATING
Information Patent Application
METROLOGY METHOD AND SYSTEM
- Publication number 20200294829
- Publication date Sep 17, 2020
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...
- Publication number 20200279783
- Publication date Sep 3, 2020
- GLOBALFOUNDRIES INC.
- PADRAIG TIMONEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING COMPLEX STRUCTURES IN SEMICONDUCTOR FABRICATION
- Publication number 20200192987
- Publication date Jun 18, 2020
- GLOBALFOUNDRIES INC.
- TAHER KAGALWALA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20190393016
- Publication date Dec 26, 2019
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
- Publication number 20180328837
- Publication date Nov 15, 2018
- NOVA MEASURING INSTRUMENTS LTD.
- Dror SHAFIR
- G01 - MEASURING TESTING
Information Patent Application
HYBRID METROLOGY TECHNIQUE
- Publication number 20170018069
- Publication date Jan 19, 2017
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR PLANNING METROLOGY MEASUREMENTS
- Publication number 20160363872
- Publication date Dec 15, 2016
- NOVA MEASURING INSTRUMENTS LTD.
- Matthew SENDELBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING STRAIN DISTRIBUTION IN A SAMPLE
- Publication number 20160139065
- Publication date May 19, 2016
- NOVA MEASURING INSTRUMENTS LTD.
- Gilad BARAK
- G01 - MEASURING TESTING
Information Patent Application
SCATTEROMETRY METHOD AND SYSTEM
- Publication number 20160076876
- Publication date Mar 17, 2016
- NOVA MEASURING INSTRUMENTS LTD.
- Gilad WAINREB
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
- Publication number 20150316468
- Publication date Nov 5, 2015
- NOVA MEASURING INSTRUMENTS LTD.
- Dror SHAFIR
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATED HYBRID METROLOGY FOR SEMICONDUCTOR DEVICE FABRICATION
- Publication number 20130245806
- Publication date Sep 19, 2013
- International Business Machines Corporation
- Alok Vaid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID METROLOGY FOR SEMICONDUCTOR DEVICES
- Publication number 20130203188
- Publication date Aug 8, 2013
- GLOBALFOUNDRIES INC.
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Application
ETCHING SYSTEM AND METHOD FOR FORMING MULTIPLE POROUS SEMICONDUCTOR...
- Publication number 20100187126
- Publication date Jul 29, 2010
- International Business Machines Corporation
- Matthew J. Sendelbach
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
OPTICAL MEASUREMENT USING FIXED POLARIZER
- Publication number 20090185168
- Publication date Jul 23, 2009
- International Business Machines Corporation
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Application
Monitoring a photolithographic process using a scatterometry target
- Publication number 20080158564
- Publication date Jul 3, 2008
- Charles N. Archie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSESSMENT AND OPTIMIZATION FOR METROLOGY INSTRUMENT INCLUDING UNCE...
- Publication number 20080151268
- Publication date Jun 26, 2008
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Application
COMBINING MULTIPLE REFERENCE MEASUREMENT COLLECTIONS INTO A WEIGHTE...
- Publication number 20060184334
- Publication date Aug 17, 2006
- International Business Machines Corporation
- Matthew J. Sendelbach
- G01 - MEASURING TESTING
Information Patent Application
Assessment and optimization for metrology instrument including unce...
- Publication number 20050197772
- Publication date Sep 8, 2005
- Charles N. Archie
- G01 - MEASURING TESTING
Information Patent Application
FORTIFIED, COMPENSATED AND UNCOMPENSATED PROCESS-SENSITIVE SCATTERO...
- Publication number 20050089775
- Publication date Apr 28, 2005
- International Business Machines Corporation
- Charles N. Archie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Matthew Sendelbach

Person

Patents Grantslast 30 patents

Method and system for optical characterization of patterned samples

TEM-based metrology method and system

Metrology method and system

TEM-based metrology method and system

Process control of semiconductor fabrication based on spectra quali...

TEM-based metrology method and system

Method and system for optical characterization of patterned samples

Measuring complex structures in semiconductor fabrication

Scatterometry method and system

Method and system for planning metrology measurements

Method and system for determining strain distribution in a sample

Automated hybrid metrology for semiconductor device fabrication

Etching system and method for forming multiple porous semiconductor...

Optical measurement using fixed polarizer

Monitoring a photolithographic process using a scatterometry target

Assessment and optimization for metrology instrument including unce...

Assessment and optimization for metrology instrument including unce...

Fortified, compensated and uncompensated process-sensitive scattero...

Combining multiple reference measurement collections into a weighte...

Method for planarizing photoresist

High selectivity collar oxide etch processes

Planarization of a non-conformal device layer in semiconductor fabr...

Methods for protecting device components from chemical mechanical p...

Planarization of a non-conformal device layer in semiconductor fabr...

Process of etching an oxide layer

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES

METROLOGY METHOD AND SYSTEM

TEM-BASED METROLOGY METHOD AND SYSTEM

TEM-BASED METROLOGY METHOD AND SYSTEM

METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...

METROLOGY METHOD AND SYSTEM

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...

MEASURING COMPLEX STRUCTURES IN SEMICONDUCTOR FABRICATION

TEM-BASED METROLOGY METHOD AND SYSTEM

METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES

HYBRID METROLOGY TECHNIQUE

METHOD AND SYSTEM FOR PLANNING METROLOGY MEASUREMENTS

METHOD AND SYSTEM FOR DETERMINING STRAIN DISTRIBUTION IN A SAMPLE

SCATTEROMETRY METHOD AND SYSTEM

METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES

AUTOMATED HYBRID METROLOGY FOR SEMICONDUCTOR DEVICE FABRICATION

HYBRID METROLOGY FOR SEMICONDUCTOR DEVICES

ETCHING SYSTEM AND METHOD FOR FORMING MULTIPLE POROUS SEMICONDUCTOR...

OPTICAL MEASUREMENT USING FIXED POLARIZER

Monitoring a photolithographic process using a scatterometry target

ASSESSMENT AND OPTIMIZATION FOR METROLOGY INSTRUMENT INCLUDING UNCE...

COMBINING MULTIPLE REFERENCE MEASUREMENT COLLECTIONS INTO A WEIGHTE...

Assessment and optimization for metrology instrument including unce...

FORTIFIED, COMPENSATED AND UNCOMPENSATED PROCESS-SENSITIVE SCATTERO...