Matthew Spuller

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Thermal chamber with improved thermal uniformity
- Patent number 11,978,646
- Issue date May 7, 2024
- Applied Materials, Inc.
- Dongming Iu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,823,901
- Issue date Nov 21, 2023
- Applied Materials Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for managing substrate outgassing
- Patent number 11,817,297
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Matthew Spuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,587,789
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 11,348,769
- Issue date May 31, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 10,770,272
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 8,125,034
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature conformal oxide formation and applications
- Patent number 7,851,385
- Issue date Dec 14, 2010
- Applied Materials, Inc.
- Matthew Spuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 7,776,516
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Wendy H. Yeh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20240087889
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH TUNABLE NITRIDATION
- Publication number 20230127138
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Wei LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT
- Publication number 20220298620
- Publication date Sep 22, 2022
- Applied Materias, Inc.
- Matthew Spuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Treatment methods for titanium nitride films
- Publication number 20220108914
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MANAGING SUBSTRATE OUTGASSING
- Publication number 20210280391
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Matthew SPULLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280428
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280418
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20200402780
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CHAMBER WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20180337075
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Dongming IU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20170294292
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY
- Publication number 20100239979
- Publication date Sep 23, 2010
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW TEMPERATURE CONFORMAL OXIDE FORMATION AND APPLICATIONS
- Publication number 20090087977
- Publication date Apr 2, 2009
- APPLIED MATERIALS, INC.
- MATTHEW SPULLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...
- Publication number 20080254233
- Publication date Oct 16, 2008
- KWANGDUK DOUGLAS LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Graded ARC for high na and immersion lithography
- Publication number 20080020319
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for plasma processing
- Publication number 20080008842
- Publication date Jan 10, 2008
- APPLIED MATERIALS, INC.
- Jyr Hong Soo
- H01 - BASIC ELECTRIC ELEMENTS

Matthew Spuller

Person

Patents Grantslast 30 patents

Thermal chamber with improved thermal uniformity

System and method for radical and thermal processing of substrates

System and method for managing substrate outgassing

System and method for radical and thermal processing of substrates

Plasma-enhanced anneal chamber for wafer outgassing

Plasma-enhanced anneal chamber for wafer outgassing

Graded ARC for high NA and immersion lithography

Low temperature conformal oxide formation and applications

Graded ARC for high NA and immersion lithography

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

PLASMA PROCESSING WITH TUNABLE NITRIDATION

ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT

Treatment methods for titanium nitride films

SYSTEM AND METHOD FOR MANAGING SUBSTRATE OUTGASSING

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING

THERMAL CHAMBER WITH IMPROVED THERMAL UNIFORMITY

PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING

GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY

LOW TEMPERATURE CONFORMAL OXIDE FORMATION AND APPLICATIONS

PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...

Graded ARC for high na and immersion lithography

Method for plasma processing