Matthias Lipinski

Person

Wappingers Fall, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing methods
- Patent number 8,697,339
- Issue date Apr 15, 2014
- International Business Machines Corporation
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology systems and methods for lithography processes
- Patent number 8,394,574
- Issue date Mar 12, 2013
- Infineon Technologies AG
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 8,349,528
- Issue date Jan 8, 2013
- Infineon Technologies AG
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 8,071,261
- Issue date Dec 6, 2011
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology systems and methods for lithography processes
- Patent number 8,067,135
- Issue date Nov 29, 2011
- Infineon Technologies AG
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having a polysilicon layer with a non-constant...
- Patent number 8,063,406
- Issue date Nov 22, 2011
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 8,007,985
- Issue date Aug 30, 2011
- Infineon Technologies AG
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Threshold voltage consistency and effective width in same-substrate...
- Patent number 7,892,939
- Issue date Feb 22, 2011
- Infineon Technologies AG
- Roland Hampp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device having doped and un...
- Patent number 7,842,579
- Issue date Nov 30, 2010
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology systems and methods for lithography processes
- Patent number 7,794,903
- Issue date Sep 14, 2010
- Infineon Technologies AG
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feature dimension control in a manufacturing process
- Patent number 7,674,350
- Issue date Mar 9, 2010
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating integrated circuit transistors by simultaneo...
- Patent number 7,541,234
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Chong Kwang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for generating a hard mask for the patterning of a layer
- Patent number 7,223,525
- Issue date May 29, 2007
- Infineon Technologies AG
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma encapsulation for electronic and microelectronic components...
- Patent number 6,933,538
- Issue date Aug 23, 2005
- Osram Opto Semiconductors GmbH
- Arvid Hunze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable e...
- Patent number 6,835,663
- Issue date Dec 28, 2004
- Infineon Technologies AG
- Matthias Lipinski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten hard mask
- Patent number 6,815,364
- Issue date Nov 9, 2004
- Infineon Technologies North America Corp.
- George Stojakovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas diffusion electrode and its production
- Patent number 6,503,655
- Issue date Jan 7, 2003
- Siemens Aktiengesellschaft
- Raino Petricevic
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Gas diffusion electron, process for producing an electrode an carbo...
- Patent number 6,361,666
- Issue date Mar 26, 2002
- Siemens Aktiengesellschaft
- Matthias Lipinski
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Patents Applicationslast 30 patents

Information Patent Application
Metrology Systems and Methods for Lithography Processes
- Publication number 20120013884
- Publication date Jan 19, 2012
- INFINEON TECHNOLOGIES AG
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Devices and Methods of Manufacturing Thereof
- Publication number 20110250530
- Publication date Oct 13, 2011
- Infineon Technologies AG
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufacturing Methods
- Publication number 20110183266
- Publication date Jul 28, 2011
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing a Semiconductor Device Having Doped and Un...
- Publication number 20110031563
- Publication date Feb 10, 2011
- Infineon Technologies North America Corp.
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Systems and Methods for Lithography Processes
- Publication number 20100283052
- Publication date Nov 11, 2010
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feature Dimension Control in a Manufacturing Process
- Publication number 20100120177
- Publication date May 13, 2010
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Threshold Voltage Consistency and Effective Width in Same-Substrate...
- Publication number 20090227086
- Publication date Sep 10, 2009
- Roland Hampp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20090023078
- Publication date Jan 22, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing methods
- Publication number 20080286698
- Publication date Nov 20, 2008
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Mask Patterns on Semiconductor Wafers that Compe...
- Publication number 20080220609
- Publication date Sep 11, 2008
- Chong Kwang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Feature Dimension Control in a Manufacturing Process
- Publication number 20080176344
- Publication date Jul 24, 2008
- Infineon Technologies North America Corp.
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device with Pre-Anneal Sandwich Gate Structure, and M...
- Publication number 20080173958
- Publication date Jul 24, 2008
- Infineon Technologies North America Corp.
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology systems and methods for lithography processes
- Publication number 20080044741
- Publication date Feb 21, 2008
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process control systems and methods
- Publication number 20070239305
- Publication date Oct 11, 2007
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacturing thereof
- Publication number 20070178388
- Publication date Aug 2, 2007
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating integrated circuit transistors by simultaneo...
- Publication number 20070099126
- Publication date May 3, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Chong Kwang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for generating a hard mask for the patterning of a layer, a...
- Publication number 20050106478
- Publication date May 19, 2005
- Infineon Technologies AG
- Matthias Lipinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma encapsulation for electronic and microelectronic components...
- Publication number 20040046165
- Publication date Mar 11, 2004
- Arvid Hunze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable e...
- Publication number 20040000534
- Publication date Jan 1, 2004
- Infineon Technologies North America Corp.
- Matthias Lipinski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten hard mask
- Publication number 20030064602
- Publication date Apr 3, 2003
- George Stojakovic
- H01 - BASIC ELECTRIC ELEMENTS

Matthias Lipinski

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing methods

Metrology systems and methods for lithography processes

Semiconductor devices and methods of manufacturing thereof

Lithography masks and methods of manufacture thereof

Metrology systems and methods for lithography processes

Semiconductor device having a polysilicon layer with a non-constant...

Semiconductor devices and methods of manufacturing thereof

Threshold voltage consistency and effective width in same-substrate...

Method for manufacturing a semiconductor device having doped and un...

Metrology systems and methods for lithography processes

Feature dimension control in a manufacturing process

Methods of fabricating integrated circuit transistors by simultaneo...

Process for generating a hard mask for the patterning of a layer

Plasma encapsulation for electronic and microelectronic components...

Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable e...

Tungsten hard mask

Gas diffusion electrode and its production

Gas diffusion electron, process for producing an electrode an carbo...

Patents Applicationslast 30 patents

Metrology Systems and Methods for Lithography Processes

Semiconductor Devices and Methods of Manufacturing Thereof

Semiconductor Device Manufacturing Methods

Method for Manufacturing a Semiconductor Device Having Doped and Un...

Metrology Systems and Methods for Lithography Processes

Feature Dimension Control in a Manufacturing Process

Threshold Voltage Consistency and Effective Width in Same-Substrate...

Lithography Masks and Methods of Manufacture Thereof

Semiconductor device manufacturing methods

Methods of Forming Mask Patterns on Semiconductor Wafers that Compe...

Feature Dimension Control in a Manufacturing Process

Semiconductor Device with Pre-Anneal Sandwich Gate Structure, and M...

Metrology systems and methods for lithography processes

Process control systems and methods

Semiconductor devices and methods of manufacturing thereof

Methods of fabricating integrated circuit transistors by simultaneo...

Process for generating a hard mask for the patterning of a layer, a...

Plasma encapsulation for electronic and microelectronic components...

Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable e...

Tungsten hard mask