Matthias Roesch

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Pupil stop for an illumination optical unit of a metrology system
- Patent number 11,531,272
- Issue date Dec 20, 2022
- Carl Zeiss SMT GmbH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 10,054,860
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,354,524
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,052,609
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 8,928,858
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 8,203,696
- Issue date Jun 19, 2012
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240361704
- Publication date Oct 31, 2024
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM
- Publication number 20220342317
- Publication date Oct 27, 2022
- Carl Zeiss SMT GMBH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20160252824
- Publication date Sep 1, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20140176924
- Publication date Jun 26, 2014
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20120188524
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20110181855
- Publication date Jul 28, 2011
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Matthias Roesch

Person

Patents Grantslast 30 patents

Pupil stop for an illumination optical unit of a metrology system

Projection exposure apparatus with optimized adjustment possibility

Projection lens for EUV microlithography, film element and method f...

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

Patents Applicationslast 30 patents

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY