Matthias Stender

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tungsten chemical mechanical planarization (CMP) with low dishing a...
- Patent number 11,884,859
- Issue date Jan 30, 2024
- VERSUM MATERIALS US, LLC
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tungsten chemical mechanical polishing for reduced oxide erosion
- Patent number 11,643,599
- Issue date May 9, 2023
- VERSUM MATERIALS US, LLC
- Chun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten chemical mechanical planarization (CMP) with low dishing a...
- Patent number 11,111,435
- Issue date Sep 7, 2021
- VERSUM MATERIALS US, LLC
- Matthias Stender
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dishing reducing in tungsten chemical mechanical polishing
- Patent number 10,570,313
- Issue date Feb 25, 2020
- VERSUM MATERIALS US, LLC
- Matthias Stender
- B24 - GRINDING POLISHING
Information Patent Grant
Additives for barrier chemical mechanical planarization
- Patent number 10,253,216
- Issue date Apr 9, 2019
- VERSUM MATERIALS US, LLC
- Matthias Stender
- B24 - GRINDING POLISHING
Information Patent Grant
Stop-on silicon containing layer additive
- Patent number 10,144,850
- Issue date Dec 4, 2018
- VERSUM MATERIALS US, LLC
- Matthias Stender
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Tellurium compounds useful for deposition of tellurium containing m...
- Patent number 9,537,095
- Issue date Jan 3, 2017
- Entegris, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 9,219,232
- Issue date Dec 22, 2015
- Entegris, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical-mechanical polishing composition containing zirconia and m...
- Patent number 8,920,667
- Issue date Dec 30, 2014
- Cabot Microelectronics Corporation
- Lin Fu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low temperature deposition of phase change memory materials
- Patent number 8,877,549
- Issue date Nov 4, 2014
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tellurium compounds useful for deposition of tellurium containing m...
- Patent number 8,796,068
- Issue date Aug 5, 2014
- Advanced Technology Materials, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
GST CMP slurries
- Patent number 8,778,211
- Issue date Jul 15, 2014
- Cabot Microelectronics Corporation
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,709,863
- Issue date Apr 29, 2014
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of phase change memory materials
- Patent number 8,679,894
- Issue date Mar 25, 2014
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor compositions for ALD/CVD of group II ruthenate thin films
- Patent number 8,524,931
- Issue date Sep 3, 2013
- Advanced Technology Materials, Inc.
- Chongying Xu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Low temperature deposition of phase change memory materials
- Patent number 8,288,198
- Issue date Oct 16, 2012
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,268,665
- Issue date Sep 18, 2012
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous Ge/Te deposition process
- Patent number 8,093,140
- Issue date Jan 10, 2012
- Advanced Technology Materials, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,008,117
- Issue date Aug 30, 2011
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 7,838,329
- Issue date Nov 23, 2010
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for making alkoxy-siloxane polyether carboxylates terminated...
- Patent number 7,625,991
- Issue date Dec 1, 2009
- Kerr Corporation
- Christos Angeletakis
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Tungsten Chemical Mechanical Polishing Slurries
- Publication number 20250019568
- Publication date Jan 16, 2025
- VERSUM MATERIALS US, LLC
- MATTHIAS STENDER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additi...
- Publication number 20240400861
- Publication date Dec 5, 2024
- VERSUM MATERIALS US, LLC
- Gregor Larbig
- B24 - GRINDING POLISHING
Information Patent Application
Phosphonium Based Polymers And Copolymers As Additives For Chemical...
- Publication number 20240261931
- Publication date Aug 8, 2024
- VERSUM MATERIALS US, LLC
- GREGOR LARBIG
- B24 - GRINDING POLISHING
Information Patent Application
IMIDAZOLIUM-BASED POLY(IONIC LIQUID)S AND USE THEREFORE
- Publication number 20240247090
- Publication date Jul 25, 2024
- VERSUM MATERIALS US, LLC
- Gregor Larbig
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tungsten Chemical Mechanical Planarization (CMP) With Low Dishing A...
- Publication number 20210340445
- Publication date Nov 4, 2021
- VERSUM MATERIALS US, LLC
- Matthias Stender
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tungsten Chemical Mechanical Planarization (CMP) With Low Dishing A...
- Publication number 20200040256
- Publication date Feb 6, 2020
- VERSUM MATERIALS US, LLC
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tungsten Chemical Mechanical Polishing For Reduced Oxide Erosion
- Publication number 20200024515
- Publication date Jan 23, 2020
- VERSUM MATERIALS US, LLC
- Chun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stop-On Silicon Containing Layer Additive
- Publication number 20190062598
- Publication date Feb 28, 2019
- VERSUM MATERIALS US, LLC
- Matthias Stender
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Additives for Barrier Chemical Mechanical Planarization
- Publication number 20180002571
- Publication date Jan 4, 2018
- Versum Materials US, LLC
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STOP-ON SILICON CONTAINING LAYER ADDITIVE
- Publication number 20170088748
- Publication date Mar 30, 2017
- Air Products and Chemicals, Inc.
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DISHING REDUCING IN TUNGSTEN CHEMICAL MECHANICAL POLISHING
- Publication number 20160237315
- Publication date Aug 18, 2016
- Air Products and Chemicals, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...
- Publication number 20140329357
- Publication date Nov 6, 2014
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20140220733
- Publication date Aug 7, 2014
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION CONTAINING ZIRCONIA AND M...
- Publication number 20140209566
- Publication date Jul 31, 2014
- Cabot Microelectronics Corporation
- Lin Fu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
- Publication number 20140206134
- Publication date Jul 24, 2014
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GST CMP SLURRIES
- Publication number 20140024216
- Publication date Jan 23, 2014
- Matthias STENDER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...
- Publication number 20130288462
- Publication date Oct 31, 2013
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20130029456
- Publication date Jan 31, 2013
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
- Publication number 20130005078
- Publication date Jan 3, 2013
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS GE/TE DEPOSITION PROCESS
- Publication number 20120108038
- Publication date May 3, 2012
- Advanced Technology Materials, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20110263100
- Publication date Oct 27, 2011
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL AMINOTROPONIMINATES, BIS-OXAZOLINATES AND GUANIDINATES
- Publication number 20110060165
- Publication date Mar 10, 2011
- Advanced Technology Materials, Inc.
- Thomas M. Cameron
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20100317150
- Publication date Dec 16, 2010
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS
- Publication number 20100279011
- Publication date Nov 4, 2010
- Advanced Technology Materials, Inc.
- Tianniu Chen
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PRECURSOR COMPOSITIONS FOR ALD/CVD OF GROUP II RUTHENATE THIN FILMS
- Publication number 20100095865
- Publication date Apr 22, 2010
- Advanced Technology Materials, Inc.
- Chongying Xu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20090305458
- Publication date Dec 10, 2009
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...
- Publication number 20090215225
- Publication date Aug 27, 2009
- Advanced Technology Materials, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COPPER (I) AMIDINATES AND GUANIDINATES, MIXED LIGAND COPPER COMPLEX...
- Publication number 20090162550
- Publication date Jun 25, 2009
- Advanced Technology Materials, Inc.
- Tianniu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
- Publication number 20090124039
- Publication date May 14, 2009
- Advanced Technology Materials, Inc.
- Jeffrey F. Roeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS GE/TE DEPOSITION PROCESS
- Publication number 20090112009
- Publication date Apr 30, 2009
- Advanced Technology Materials, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Matthias Stender

Person

Patents Grantslast 30 patents

Tungsten chemical mechanical planarization (CMP) with low dishing a...

Tungsten chemical mechanical polishing for reduced oxide erosion

Tungsten chemical mechanical planarization (CMP) with low dishing a...

Dishing reducing in tungsten chemical mechanical polishing

Additives for barrier chemical mechanical planarization

Stop-on silicon containing layer additive

Tellurium compounds useful for deposition of tellurium containing m...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Chemical-mechanical polishing composition containing zirconia and m...

Low temperature deposition of phase change memory materials

Tellurium compounds useful for deposition of tellurium containing m...

GST CMP slurries

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Low temperature deposition of phase change memory materials

Precursor compositions for ALD/CVD of group II ruthenate thin films

Low temperature deposition of phase change memory materials

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Amorphous Ge/Te deposition process

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Method for making alkoxy-siloxane polyether carboxylates terminated...

Patents Applicationslast 30 patents

Tungsten Chemical Mechanical Polishing Slurries

Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additi...

Phosphonium Based Polymers And Copolymers As Additives For Chemical...

IMIDAZOLIUM-BASED POLY(IONIC LIQUID)S AND USE THEREFORE

Tungsten Chemical Mechanical Planarization (CMP) With Low Dishing A...

Tungsten Chemical Mechanical Planarization (CMP) With Low Dishing A...

Tungsten Chemical Mechanical Polishing For Reduced Oxide Erosion

Stop-On Silicon Containing Layer Additive

Additives for Barrier Chemical Mechanical Planarization

STOP-ON SILICON CONTAINING LAYER ADDITIVE

DISHING REDUCING IN TUNGSTEN CHEMICAL MECHANICAL POLISHING

TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

CHEMICAL-MECHANICAL POLISHING COMPOSITION CONTAINING ZIRCONIA AND M...

LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS

GST CMP SLURRIES

TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS

AMORPHOUS GE/TE DEPOSITION PROCESS

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

METAL AMINOTROPONIMINATES, BIS-OXAZOLINATES AND GUANIDINATES

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS

PRECURSOR COMPOSITIONS FOR ALD/CVD OF GROUP II RUTHENATE THIN FILMS

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...

COPPER (I) AMIDINATES AND GUANIDINATES, MIXED LIGAND COPPER COMPLEX...

LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS

AMORPHOUS GE/TE DEPOSITION PROCESS