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Matthias Sturm
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Waiblingen, DE
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last 30 patents
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Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
Publication number
20230126018
Publication date
Apr 27, 2023
Carl Zeiss SMT GMBH
Hartmut ENKISCH
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
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Patent Application
OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM
Publication number
20220179329
Publication date
Jun 9, 2022
Carl Zeiss SMT GMBH
Anastasia Gonchar
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING