Matthias Zinke

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure with substantially straight contact profile
- Patent number 11,127,683
- Issue date Sep 21, 2021
- GLOBALFOUNDRIES U.S. INC.
- Ronald Naumann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for reducing plasma-induced etch damage during the format...
- Patent number 9,111,999
- Issue date Aug 18, 2015
- GLOBALFOUNDRIES Inc.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for reducing plasma-induced etch damage during the format...
- Patent number 9,018,102
- Issue date Apr 28, 2015
- GLOBALFOUNDRIES Inc.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STRUCTURE WITH SUBSTANTIALLY STRAIGHT CONTACT PROFILE
- Publication number 20190229063
- Publication date Jul 25, 2019
- GLOBALFOUNDRIES INC.
- Ronald NAUMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH SUBSTANTIALLY STRAIGHT CONTACT PROFILE
- Publication number 20190157213
- Publication date May 23, 2019
- GLOBALFOUNDRIES INC.
- Ronald NAUMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR REDUCING PLASMA-INDUCED ETCH DAMAGE DURING THE FORMAT...
- Publication number 20150200131
- Publication date Jul 16, 2015
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Reducing Plasma-Induced Etch Damage During the Format...
- Publication number 20120214305
- Publication date Aug 23, 2012
- GLOBALFOUNDRIES INC.
- Mohammed Radwan
- H01 - BASIC ELECTRIC ELEMENTS