Maurits VAN DER SCHAAR

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,066,764
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,019,377
- Issue date Jun 25, 2024
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,709,436
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for monitoring a manufacturing process, inspe...
- Patent number 11,698,346
- Issue date Jul 11, 2023
- ASML Netherlands B.V.
- Ioana Sorina Barbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,580,274
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 11,525,786
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 11,480,884
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system, device manufac...
- Patent number 11,466,980
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 11,392,044
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 11,320,745
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 11,221,560
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Guangqing Chen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology using a plurality of metrology target measurement recipes
- Patent number 11,187,995
- Issue date Nov 30, 2021
- ASML Netherlands B.V.
- Victor Emanuel Calado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,125,806
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 11,003,099
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 10,955,353
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,859,923
- Issue date Dec 8, 2020
- ASML Netherlands B.V.
- Gonzalo Roberto Sanguinetti
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic method and...
- Patent number 10,802,409
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Chi-Hsiang Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 10,802,408
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, apparatus and computer program
- Patent number 10,794,693
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Farzad Farhadzadeh
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 10,725,386
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternative target design for metrology using modulation techniques
- Patent number 10,585,357
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20230273255
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20230236515
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20230185990
- Publication date Jun 15, 2023
- ASML NETHERLANDS B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR APPLYING A DEPOSITION MODEL IN A SEMICONDUCTOR MANUFACTU...
- Publication number 20220350254
- Publication date Nov 3, 2022
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVEMENTS IN METROLOGY TARGETS
- Publication number 20220260929
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED COMPUTER PRODUCT
- Publication number 20220252990
- Publication date Aug 11, 2022
- ASML Netherlands B,V.
- Narjes JAVAHERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20220113638
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20220035255
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210389365
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES
- Publication number 20210208512
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Victor Emanuel CALADO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20210208083
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20210055663
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20200401054
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20200356012
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20200183290
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Gonzalo Roberto SANGUINETTI
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20200150547
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20200050114
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20200041563
- Publication date Feb 6, 2020
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Design of a Metrology Target
- Publication number 20200033741
- Publication date Jan 30, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20190339211
- Publication date Nov 7, 2019
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20190317412
- Publication date Oct 17, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Maurits VAN DER SCHAAR

Person

Patents Grantslast 30 patents

Metrology apparatus and method for determining a characteristic of...

Target for measuring a parameter of a lithographic process

Metrology targets

Metrology apparatus and method for determining a characteristic of...

Methods and apparatus for monitoring a manufacturing process, inspe...

Method and apparatus for inspection and metrology

Method and apparatus for angular-resolved spectroscopic lithography...

Method for optimization of a lithographic process

Metrology method and apparatus, lithographic system, device manufac...

Metrology method, target and substrate

Method and apparatus for illumination adjustment

Method of determining a position of a feature

Metrology method, patterning device, apparatus and computer program

Measuring a process parameter for a manufacturing process involving...

Method and apparatus for design of a metrology target

Metrology method, target and substrate

Metrology using a plurality of metrology target measurement recipes

Metrology apparatus and method for determining a characteristic of...

Focus and overlay improvement by modifying a patterning device

Method and apparatus for measuring a parameter of a lithographic pr...

Method and apparatus for design of a metrology target

Metrology method, patterning device, apparatus and computer program

Method and apparatus for angular-resolved spectroscopic lithography...

Method of measuring a structure, inspection apparatus, lithographic...

Metrology method and apparatus, substrate, lithographic method and...

Method for optimization of a lithographic process

Metrology method, apparatus and computer program

Metrology method and apparatus, lithographic system and device manu...

Metrology method, target and substrate

Alternative target design for metrology using modulation techniques

Patents Applicationslast 30 patents

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD FOR APPLYING A DEPOSITION MODEL IN A SEMICONDUCTOR MANUFACTU...

IMPROVEMENTS IN METROLOGY TARGETS

METROLOGY METHOD AND ASSOCIATED COMPUTER PRODUCT

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

METROLOGY METHOD, TARGET AND SUBSTRATE

TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

Measuring a Process Parameter for a Manufacturing Process Involving...

METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

METROLOGY METHOD, TARGET AND SUBSTRATE

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

METHOD OF DETERMINING A POSITION OF A FEATURE

Metrology Method, Patterning Device, Apparatus and Computer Program

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Metrology Apparatus and Method for Determining a Characteristic of...

Method and Apparatus for Design of a Metrology Target

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD OF DETERMINING A POSITION OF A FEATURE

A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS