Maximilian Stadler

Person

Haiming, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Polished semiconductor wafer and process for producing it
- Patent number 7,972,963
- Issue date Jul 5, 2011
- Siltronic AG
- Thomas Teuschler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a polished semiconductor
- Patent number 7,829,467
- Issue date Nov 9, 2010
- Siltronic AG
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and device for the wet-chemical treatment of silicon
- Patent number 7,083,741
- Issue date Aug 1, 2006
- Siltronic AG
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for the wet chemical treatment of a semiconductor wafer
- Patent number 6,610,213
- Issue date Aug 26, 2003
- Wacker Siltronic Gesellschaft für Halbleitermaterialien
- Günter Schwab
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for the wet-chemical surface treatment of a semiconductor w...
- Patent number 6,530,381
- Issue date Mar 11, 2003
- Wacker Siltronic Gesellschaft fur Halbleitermaterialien AG
- Günter Schwab
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for treating semiconductor material with an acid-containing...
- Patent number 5,587,046
- Issue date Dec 24, 1996
- Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magazine for holding disk-type workpieces in particular semiconduct...
- Patent number 5,236,548
- Issue date Aug 17, 1993
- Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR PROVIDING LIQUID SILICON
- Publication number 20100290973
- Publication date Nov 18, 2010
- centrotherm SiTec GmbH
- Alrbrecht Mozer
- C30 - CRYSTAL GROWTH
Information Patent Application
Polished semiconductor wafer and process for producing it
- Publication number 20080057714
- Publication date Mar 6, 2008
- Siltronic AG
- Thomas Teuschler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Producing A Polished Semiconductor
- Publication number 20070259531
- Publication date Nov 8, 2007
- Siltronic AG
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for treating a semiconductor wafer with a gaseous medium, a...
- Publication number 20060138539
- Publication date Jun 29, 2006
- Siltronic AG
- Maximilian Stadler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for the wet-chemical surface treatment of a semiconductor w...
- Publication number 20040266191
- Publication date Dec 30, 2004
- Gunter Schwab
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polished semiconductor wafer and process for producing it
- Publication number 20040222416
- Publication date Nov 11, 2004
- Thomas Teuschler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and device for the wet-chemical treatment of silicon
- Publication number 20040129679
- Publication date Jul 8, 2004
- Maximilian Stadler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Maximilian Stadler

Person

Patents Grantslast 30 patents

Polished semiconductor wafer and process for producing it

Method for producing a polished semiconductor

Process and device for the wet-chemical treatment of silicon

Process for the wet chemical treatment of a semiconductor wafer

Process for the wet-chemical surface treatment of a semiconductor w...

Process for treating semiconductor material with an acid-containing...

Magazine for holding disk-type workpieces in particular semiconduct...

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR PROVIDING LIQUID SILICON

Polished semiconductor wafer and process for producing it

Method For Producing A Polished Semiconductor

Process for treating a semiconductor wafer with a gaseous medium, a...

Process for the wet-chemical surface treatment of a semiconductor w...

Polished semiconductor wafer and process for producing it

Process and device for the wet-chemical treatment of silicon