Maya Angelova Doytcheva

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Alignment target contrast in a lithographic double patterning process
- Patent number 8,980,724
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Improving alignment target contrast in a lithographic double patter...
- Patent number 8,709,908
- Issue date Apr 29, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing alignment target contrast
- Patent number 8,625,096
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for providing resist alignment marks in a doub...
- Patent number 8,329,366
- Issue date Dec 11, 2012
- ASML Netherlands B.V.
- Maya Angelova Doytcheva
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Marker structure and method of forming the same
- Patent number 8,319,967
- Issue date Nov 27, 2012
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20140192333
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Harry SEWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20130070226
- Publication date Mar 21, 2013
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Apparatus and Method for Providing Resist Alignment Marks in a Doub...
- Publication number 20130017378
- Publication date Jan 17, 2013
- ASML NETHERLANDS B.V.
- Maya Angelova Doytcheva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Increasing Alignment Target Contrast
- Publication number 20110075238
- Publication date Mar 31, 2011
- ASML NETHERLANDS B.V.
- Harry SEWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Method for Providing Resist Alignment Marks in a Doub...
- Publication number 20100323171
- Publication date Dec 23, 2010
- ASML Holding N.V.
- Maya Angelova DOYTCHEVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20100301458
- Publication date Dec 2, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20090147232
- Publication date Jun 11, 2009
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas discharge lamp with down conversion phosphor
- Publication number 20060290258
- Publication date Dec 28, 2006
- KONINKLIKE PHILIPS ELECTRONICS, N.V.
- Claus Feldmann
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Maya Angelova Doytcheva

Person

Patents Grantslast 30 patents

Alignment target contrast in a lithographic double patterning process

Improving alignment target contrast in a lithographic double patter...

Method and system for increasing alignment target contrast

Apparatus and method for providing resist alignment marks in a doub...

Marker structure and method of forming the same

Patents Applicationslast 30 patents

Alignment Target Contrast in a Lithographic Double Patterning Process

MARKER STRUCTURE AND METHOD OF FORMING THE SAME

Apparatus and Method for Providing Resist Alignment Marks in a Doub...

Method and System for Increasing Alignment Target Contrast

Apparatus and Method for Providing Resist Alignment Marks in a Doub...

Alignment Target Contrast in a Lithographic Double Patterning Process

MARKER STRUCTURE AND METHOD OF FORMING THE SAME

Gas discharge lamp with down conversion phosphor