McDonald Robinson

Person

Paradise Valley, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas injection system for reaction chambers in CVD systems
- Patent number 5,819,684
- Issue date Oct 13, 1998
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas injectors for reaction chambers in CVD systems
- Patent number 5,525,157
- Issue date Jun 11, 1996
- Advanced Semiconductor Materials America, Inc.
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas injectors for reaction chambers in CVD systems
- Patent number 5,458,918
- Issue date Oct 17, 1995
- Advanced Semiconductor Materials America, Inc.
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Chemical vapor desposition system
- Patent number 5,435,682
- Issue date Jul 25, 1995
- Advanced Semiconductor Materials America, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas injectors for reaction chambers in CVD systems
- Patent number 5,411,590
- Issue date May 2, 1995
- Advanced Semiconductor Materials America, Inc.
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer handling system with bernoulli pick-up
- Patent number 5,324,155
- Issue date Jun 28, 1994
- Advanced Semiconductor Materials America, Inc.
- Dennis L. Goodwin
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Gas injectors for reaction chambers in CVD systems
- Patent number 5,221,556
- Issue date Jun 22, 1993
- Epsilon Technology, Inc.
- Mark R. Hawkins
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for loading a substrate into a GVD apparatus
- Patent number 5,156,521
- Issue date Oct 20, 1992
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate loading apparatus for a CVD process
- Patent number 5,092,728
- Issue date Mar 3, 1992
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer handling system with Bernoulli pick-up
- Patent number 5,080,549
- Issue date Jan 14, 1992
- Epsilon Technology, Inc.
- Dennis L. Goodwin
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Substrate handling and transporting apparatus
- Patent number 5,020,475
- Issue date Jun 4, 1991
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Heating system for substrates
- Patent number 4,975,561
- Issue date Dec 4, 1990
- Epsilon Technology Inc.
- McDonald Robinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for epitaxial deposition of silicon
- Patent number 4,874,464
- Issue date Oct 17, 1989
- Epsilon Limited Partnership
- Dennis L. Goodwin
- C30 - CRYSTAL GROWTH
Information Patent Grant
Heating system for reaction chamber of chemical vapor deposition eq...
- Patent number 4,836,138
- Issue date Jun 6, 1989
- Epsilon Technology, Inc.
- McDonald Robinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition system
- Patent number 4,828,224
- Issue date May 9, 1989
- Epsilon Technology, Inc.
- Richard Crabb
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus for chemical vapor deposition using an axially symmetric...
- Patent number 4,798,165
- Issue date Jan 17, 1989
- Epsilon
- Wiebe B. deBoer
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for substrate heating in an axially symmetric...
- Patent number 4,789,771
- Issue date Dec 6, 1988
- Epsilon Limited Partnership
- McDonald Robinson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for substrate heating in an axially symmetric...
- Patent number 4,654,509
- Issue date Mar 31, 1987
- Epsilon Limited Partnership
- McDonald Robinson
- C30 - CRYSTAL GROWTH

McDonald Robinson

Person

Patents Grantslast 30 patents

Gas injection system for reaction chambers in CVD systems

Gas injectors for reaction chambers in CVD systems

Gas injectors for reaction chambers in CVD systems

Chemical vapor desposition system

Gas injectors for reaction chambers in CVD systems

Wafer handling system with bernoulli pick-up

Gas injectors for reaction chambers in CVD systems

Method for loading a substrate into a GVD apparatus

Substrate loading apparatus for a CVD process

Wafer handling system with Bernoulli pick-up

Substrate handling and transporting apparatus

Heating system for substrates

Process for epitaxial deposition of silicon

Heating system for reaction chamber of chemical vapor deposition eq...

Chemical vapor deposition system

Apparatus for chemical vapor deposition using an axially symmetric...

Method and apparatus for substrate heating in an axially symmetric...

Method and apparatus for substrate heating in an axially symmetric...