Medhat TOUKHY

Person

Flemington, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enviromentally stable, thick film, chemically amplified resist
- Patent number 11,385,543
- Issue date Jul 12, 2022
- Merck Patent GmbH
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive material
- Patent number 9,012,126
- Issue date Apr 21, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working thick film photoresist
- Patent number 8,906,594
- Issue date Dec 9, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive material
- Patent number 8,841,062
- Issue date Sep 23, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thick film resists
- Patent number 8,715,918
- Issue date May 6, 2014
- AZ Electronic Materials USA Corp.
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 7,824,837
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for imaging thick films
- Patent number 7,255,970
- Issue date Aug 14, 2007
- AZ Electronic Materials USA Corp.
- Medhat A. Toukhy
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing an image using a first minimum bottom antiref...
- Patent number 7,070,914
- Issue date Jul 4, 2006
- AZ Electronic Materials USA Corp.
- Mark O. Neisser
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 6,844,131
- Issue date Jan 18, 2005
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST FORMULATION FOR PRODUCING UNDERCUT PATTERN PROFILES
- Publication number 20200319555
- Publication date Oct 8, 2020
- Merck Patent GmbH
- Anupama MUKHERJEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST
- Publication number 20200183278
- Publication date Jun 11, 2020
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20140154624
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE MATERIAL
- Publication number 20130337380
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING THICK FILM PHOTORESIST
- Publication number 20130337381
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Chunwei CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THICK FILM RESISTS
- Publication number 20090081589
- Publication date Mar 26, 2009
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive -Working Photoimageable Bottom Antireflective Coating
- Publication number 20080090184
- Publication date Apr 17, 2008
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20080038666
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATINGS
- Publication number 20080032229
- Publication date Feb 7, 2008
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developable undercoating composition for thick photoresist layers
- Publication number 20070105040
- Publication date May 10, 2007
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for imaging thick films
- Publication number 20070015080
- Publication date Jan 18, 2007
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing an image using a first minimum bottom antiref...
- Publication number 20060199103
- Publication date Sep 7, 2006
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoimageable bottom antireflective coating
- Publication number 20060063105
- Publication date Mar 23, 2006
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoimageable bottom antireflective coating
- Publication number 20050214674
- Publication date Sep 29, 2005
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bottom antireflective coatings
- Publication number 20050074688
- Publication date Apr 7, 2005
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generators
- Publication number 20040265733
- Publication date Dec 30, 2004
- Francis M. Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoimageable bottom antireflective coating
- Publication number 20030215736
- Publication date Nov 20, 2003
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing an image using a first minimum bottom antiref...
- Publication number 20030129547
- Publication date Jul 10, 2003
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoimageable bottom antireflective coating
- Publication number 20030129531
- Publication date Jul 10, 2003
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Medhat TOUKHY

Person

Patents Grantslast 30 patents

Negative resist formulation for producing undercut pattern profiles

Enviromentally stable, thick film, chemically amplified resist

Positive photosensitive material

Negative-working thick film photoresist

Positive working photosensitive material

Thick film resists

Positive-working photoimageable bottom antireflective coating

Positive-working photoimageable bottom antireflective coating

Photoresist composition for imaging thick films

Process for producing an image using a first minimum bottom antiref...

Positive-working photoimageable bottom antireflective coating

Patents Applicationslast 30 patents

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

NEGATIVE RESIST FORMULATION FOR PRODUCING UNDERCUT PATTERN PROFILES

ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

POSITIVE PHOTOSENSITIVE MATERIAL

NEGATIVE-WORKING THICK FILM PHOTORESIST

THICK FILM RESISTS

Positive -Working Photoimageable Bottom Antireflective Coating

Positive-Working Photoimageable Bottom Antireflective Coating

BOTTOM ANTIREFLECTIVE COATINGS

Developable undercoating composition for thick photoresist layers

Photoresist composition for imaging thick films

Process for producing an image using a first minimum bottom antiref...

Negative-working photoimageable bottom antireflective coating

Positive-working photoimageable bottom antireflective coating

Bottom antireflective coatings

Photoacid generators

Negative-working photoimageable bottom antireflective coating

Process for producing an image using a first minimum bottom antiref...

Positive-working photoimageable bottom antireflective coating