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Megumi Takahashi
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Shizuoka, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive siloxane composition and pattern forming method usin...
Patent number
11,899,365
Issue date
Feb 13, 2024
Merck Patent GmbH
Naofumi Yoshida
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polysiloxane, composition comprising the same and cured film using...
Patent number
11,866,553
Issue date
Jan 9, 2024
Merck Patent GmbH
Naofumi Yoshida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
Patent number
11,860,537
Issue date
Jan 2, 2024
Merck Patent GmbH
Naofumi Yoshida
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive siloxane composition and cured film formed by using...
Patent number
11,644,754
Issue date
May 9, 2023
Merck Patent GmbH
Naofumi Yoshida
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
Patent number
11,392,032
Issue date
Jul 19, 2022
Merck Patent GmbH
Naofumi Yoshida
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive siloxane composition
Patent number
10,606,173
Issue date
Mar 31, 2020
AZ Electronic Materials (Luxembourg) S.A.R.L.
Megumi Takahashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive type photosensitive siloxane composition
Patent number
10,409,161
Issue date
Sep 10, 2019
AZ Electronic Materials (Luxembourg) S.A.R.L.
Motoki Misumi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Negative-working photosensitive siloxane composition
Patent number
9,684,240
Issue date
Jun 20, 2017
AZ Electronic Materials (Luxembourg) S.A.R.L.
Daishi Yokoyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composite of metal oxide nanoparticles and silsesquioxane polymer,...
Patent number
9,505,888
Issue date
Nov 29, 2016
AZ Electronic Materials (Luxembourg) S.A.R.L.
Naofumi Yoshida
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Negative-working photosensitive siloxane composition
Patent number
9,164,386
Issue date
Oct 20, 2015
AZ Electronic Materials (Luxembourg) S.A.R.L.
Daishi Yokoyama
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
POLYSILOXANE, COMPOSITION COMPRISING THE SAME AND CURED FILM USING...
Publication number
20210171718
Publication date
Jun 10, 2021
Merck Patent GmbH
Naofumi YOSHIDA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...
Publication number
20210116811
Publication date
Apr 22, 2021
Merck Patent GmbH
Naofumi YOSHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION AND PATTERN FORMING METHOD USIN...
Publication number
20210055657
Publication date
Feb 25, 2021
Merck Patent GmbH
Naofumi YOSHIDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM US...
Publication number
20200225583
Publication date
Jul 16, 2020
Merck Patent GmbH
Naofumi YOSHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION
Publication number
20200201179
Publication date
Jun 25, 2020
MERCK PERFORMANCE MATERIALS MANUFACTURING G.K.
MEGUMI TAKAHASHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING...
Publication number
20200089117
Publication date
Mar 19, 2020
Merck Patent GmbH
Naofumi YOSHIDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...
Publication number
20200073241
Publication date
Mar 5, 2020
Merck Patent GmbH
Naofumi YOSHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION
Publication number
20190077961
Publication date
Mar 14, 2019
AZ Electronic Materials (Luxembourg) S.r.r.l.
MEGUMI TAKAHASHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION
Publication number
20190064660
Publication date
Feb 28, 2019
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Motoki MISUMI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITE OF METAL OXIDE NANOPARTICLES AND SILSESQUIOXANE POLYMER,...
Publication number
20150329679
Publication date
Nov 19, 2015
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Naofumi YOSHIDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION
Publication number
20150331319
Publication date
Nov 19, 2015
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Daishi Yokoyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION
Publication number
20150064613
Publication date
Mar 5, 2015
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Daishi Yokoyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY