Meiliang Wang

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Organoamino-functionalized cyclic oligosiloxanes for deposition of...
- Patent number 12,018,040
- Issue date Jun 25, 2024
- VERSUM MATERIALS US, LLC
- Matthew R. Macdonald
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trisilylamine derivatives as precursors for high growth rate silico...
- Patent number 11,702,743
- Issue date Jul 18, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods for making silicon containing films
- Patent number 11,626,279
- Issue date Apr 11, 2023
- VERSUM MATERIALS US, LLC
- Anupama Mallikarjunan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organoaminosilane precursors and methods for depositing films compr...
- Patent number 10,453,675
- Issue date Oct 22, 2019
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High temperature atomic layer deposition of silicon oxide thin films
- Patent number 9,460,912
- Issue date Oct 4, 2016
- Air Products and Chemicals, Inc.
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF...
- Publication number 20220333241
- Publication date Oct 20, 2022
- VERSUM MATERIALS US, LLC
- MEILIANG WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOAMINODISILAZANES FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION...
- Publication number 20220178028
- Publication date Jun 9, 2022
- VERSUM MATERIALS US, LLC
- LEI XINJIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR DEPOSITION OF...
- Publication number 20220081453
- Publication date Mar 17, 2022
- VERSUM MATERIALS US, LLC
- MATTHEW R. MACDONALD
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM
- Publication number 20210380418
- Publication date Dec 9, 2021
- VERSUM MATERIALS US, LLC
- MEILIANG WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRISILYLAMINE DERIVATIVES AS PRECURSORS FOR HIGH GROWTH RATE SILICO...
- Publication number 20210340673
- Publication date Nov 4, 2021
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...
- Publication number 20150087139
- Publication date Mar 26, 2015
- Air Products and Chemicals, Inc.
- Mark Leonard O'Neill
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITIONS AND METHODS FOR MAKING SILICON CONTAINING FILMS
- Publication number 20150014823
- Publication date Jan 15, 2015
- Air Products and Chemicals, Inc.
- Anupama Mallikarjunan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS
- Publication number 20130295779
- Publication date Nov 7, 2013
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Meiliang Wang

Person

Patents Grantslast 30 patents

Organoamino-functionalized cyclic oligosiloxanes for deposition of...

Trisilylamine derivatives as precursors for high growth rate silico...

Compositions and methods for making silicon containing films

Organoaminosilane precursors and methods for depositing films compr...

High temperature atomic layer deposition of silicon oxide thin films

Patents Applicationslast 30 patents

COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF...

ORGANOAMINODISILAZANES FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION...

ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR DEPOSITION OF...

HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM

TRISILYLAMINE DERIVATIVES AS PRECURSORS FOR HIGH GROWTH RATE SILICO...

ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...

COMPOSITIONS AND METHODS FOR MAKING SILICON CONTAINING FILMS

HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS