Meitoku Aibara

Person

Koshi City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning method, substrate cleaning system, and storage m...
- Patent number 11,600,499
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Meitoku Aibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method
- Patent number 11,551,941
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 11,367,630
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 10,811,283
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, substrate cleaning method, and recordi...
- Patent number 10,792,711
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Meitoku Aibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system and memory medium
- Patent number 10,734,255
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing system, substrate cleaning method, and recordi...
- Patent number 10,272,478
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Meitoku Aibara
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,121,646
- Issue date Nov 6, 2018
- Tokyo Electron Limited
- Koji Kagawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 9,953,826
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,870,914
- Issue date Jan 16, 2018
- Tokyo Electron Limited
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and recording medium
- Patent number 9,818,598
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Meitoku Aibara
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 9,768,039
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Kazuhiro Aiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and nozzle cleaning method
- Patent number 9,764,345
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Yoshihiro Kai
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20220277968
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND STORAGE M...
- Publication number 20210265180
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20200395230
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD
- Publication number 20200303220
- Publication date Sep 24, 2020
- TOKYO ELECTRON LIMITED
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...
- Publication number 20190118227
- Publication date Apr 25, 2019
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20180330971
- Publication date Nov 15, 2018
- TOKYO ELECTRON LIMITED
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180082831
- Publication date Mar 22, 2018
- TOKYO ELECTRON LIMITED
- Koji KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM
- Publication number 20170345685
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20170040154
- Publication date Feb 9, 2017
- TOKYO ELECTRON LIMITED
- Koji KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...
- Publication number 20160035561
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM
- Publication number 20160035564
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20150128994
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20140373877
- Publication date Dec 25, 2014
- Shigehisa Inoue
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD
- Publication number 20140352730
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140137902
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Kazuhiro Aiura
- H01 - BASIC ELECTRIC ELEMENTS

Meitoku Aibara

Person

Patents Grantslast 30 patents

Substrate cleaning method, substrate cleaning system, and storage m...

Substrate cleaning method

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate processing system, substrate cleaning method, and recordi...

Substrate cleaning method, substrate cleaning system and memory medium

Substrate processing system, substrate cleaning method, and recordi...

Substrate processing apparatus and substrate processing method

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate processing apparatus and substrate processing method

Substrate cleaning method and recording medium

Substrate processing apparatus

Substrate processing apparatus and nozzle cleaning method

Patents Applicationslast 30 patents

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND STORAGE M...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE CLEANING METHOD

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...

SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD

SUBSTRATE PROCESSING APPARATUS