Melanie Sherony

Person

Fishkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Establishing a thermal profile across a semiconductor chip
- Patent number 9,178,495
- Issue date Nov 3, 2015
- GlobalFoundries U.S. 2 LLC
- Terence B. Hook
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
In-situ annealing for extending the lifetime of CMOS products
- Patent number 9,064,824
- Issue date Jun 23, 2015
- International Business Machines Corporation
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ relaxation for improved CMOS product lifetime
- Patent number 9,059,120
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Terence B. Hook
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Self-limiting oxygen seal for high-K dielectric and design structure
- Patent number 8,564,074
- Issue date Oct 22, 2013
- International Business Machines Corporation
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure deuterium treatment for semiconductor/high-K insulato...
- Patent number 8,445,969
- Issue date May 21, 2013
- FREESCALE SEMICONDUCTOR, INC.
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Balancing NFET and PFET performance using straining layers
- Patent number 8,106,462
- Issue date Jan 31, 2012
- International Business Machines Corporation
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Threshold voltage improvement employing fluorine implantation and a...
- Patent number 7,893,502
- Issue date Feb 22, 2011
- International Business Machines Corporation
- Weipeng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor resistor formed in metal gate stack
- Patent number 7,879,666
- Issue date Feb 1, 2011
- FREESCALE SEMICONDUCTOR, INC.
- Da Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure of static random access memory with stress engineering fo...
- Patent number 7,471,548
- Issue date Dec 30, 2008
- International Business Machines Corporation
- Christopher V. Baiocco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halo-free non-rectifying contact on chip with halo source/drain dif...
- Patent number 6,750,109
- Issue date Jun 15, 2004
- International Business Machines Corporation
- James A. Culp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halo-free non-rectifying contact on chip with halo source/drain dif...
- Patent number 6,429,482
- Issue date Aug 6, 2002
- International Business Machines Corporation
- James A. Culp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully amorphized source/drain for leaky junctions
- Patent number 6,395,587
- Issue date May 28, 2002
- International Business Machines Corporation
- Scott Crowder
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ESTABLISHING A THERMAL PROFILE ACROSS A SEMICONDUCTOR CHIP
- Publication number 20160027713
- Publication date Jan 28, 2016
- GLOBALFOUNDRIES INC.
- TERENCE B. HOOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTABLISHING A THERMAL PROFILE ACROSS A SEMICONDUCTOR CHIP
- Publication number 20150270828
- Publication date Sep 24, 2015
- INTERNTIONAL BUSINESS MACHINES CORPORATION
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU RELAXATION FOR IMPROVED CMOS PRODUCT LIFETIME
- Publication number 20150132862
- Publication date May 14, 2015
- International Business Machines Corporation
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ANNEALING FOR EXTENDING THE LIFETIME OF CMOS PRODUCTS
- Publication number 20150129898
- Publication date May 14, 2015
- International Business Machines Corporation
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING OXYGEN SEAL FOR HIGH-K DIELECTRIC, RELATED METHOD AND...
- Publication number 20130134545
- Publication date May 30, 2013
- International Business Machines Corporation
- Terence B. Hook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE DEUTERIUM TREATMENT FOR SEMICONDUCTOR/HIGH-K INSULATO...
- Publication number 20120273894
- Publication date Nov 1, 2012
- International Business Machines Corporation
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BALANCING NFET AND PFET PERFORMANCE USING STRAINING LAYERS
- Publication number 20110169096
- Publication date Jul 14, 2011
- International Business Machines Corporation
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THRESHOLD VOLTAGE IMPROVEMENT EMPLOYING FLUORINE IMPLANTATION AND A...
- Publication number 20100289088
- Publication date Nov 18, 2010
- International Business Machines Corporation
- Weipeng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Resistor Formed in Metal Gate Stack
- Publication number 20100019328
- Publication date Jan 28, 2010
- Da Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESS ENGINEERING FOR SRAM STABILITY
- Publication number 20090166757
- Publication date Jul 2, 2009
- International Business Machines Corporation
- Christopher V. Baiocco
- G01 - MEASURING TESTING
Information Patent Application
STRESS ENGINEERING FOR SRAM STABILITY
- Publication number 20080142895
- Publication date Jun 19, 2008
- International Business Machines Corporation
- Christopher V. Baiocco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Halo-free non-rectifying contact on chip with halo source/drain dif...
- Publication number 20020149058
- Publication date Oct 17, 2002
- International Business Machines Corporation
- James A. Culp
- H01 - BASIC ELECTRIC ELEMENTS

Melanie Sherony

Person

Patents Grantslast 30 patents

Establishing a thermal profile across a semiconductor chip

In-situ annealing for extending the lifetime of CMOS products

In-situ relaxation for improved CMOS product lifetime

Self-limiting oxygen seal for high-K dielectric and design structure

High pressure deuterium treatment for semiconductor/high-K insulato...

Balancing NFET and PFET performance using straining layers

Threshold voltage improvement employing fluorine implantation and a...

Semiconductor resistor formed in metal gate stack

Structure of static random access memory with stress engineering fo...

Halo-free non-rectifying contact on chip with halo source/drain dif...

Halo-free non-rectifying contact on chip with halo source/drain dif...

Fully amorphized source/drain for leaky junctions

Patents Applicationslast 30 patents

ESTABLISHING A THERMAL PROFILE ACROSS A SEMICONDUCTOR CHIP

ESTABLISHING A THERMAL PROFILE ACROSS A SEMICONDUCTOR CHIP

IN-SITU RELAXATION FOR IMPROVED CMOS PRODUCT LIFETIME

IN-SITU ANNEALING FOR EXTENDING THE LIFETIME OF CMOS PRODUCTS

SELF-LIMITING OXYGEN SEAL FOR HIGH-K DIELECTRIC, RELATED METHOD AND...

HIGH PRESSURE DEUTERIUM TREATMENT FOR SEMICONDUCTOR/HIGH-K INSULATO...

BALANCING NFET AND PFET PERFORMANCE USING STRAINING LAYERS

THRESHOLD VOLTAGE IMPROVEMENT EMPLOYING FLUORINE IMPLANTATION AND A...

Semiconductor Resistor Formed in Metal Gate Stack

STRESS ENGINEERING FOR SRAM STABILITY

STRESS ENGINEERING FOR SRAM STABILITY

Halo-free non-rectifying contact on chip with halo source/drain dif...