Menso Hendriks

Person

Soest, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for depositing thin films by mixed pulsed CVD and ALD
- Patent number 8,017,182
- Issue date Sep 13, 2011
- ASM International N.V.
- Menso Hendriks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active reactant vapor pulse monitoring in a chemical reactor
- Patent number 7,374,941
- Issue date May 20, 2008
- ASM Iternational N.V.
- Niklas Bondestam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for processing semiconductor substrates
- Patent number 7,273,819
- Issue date Sep 25, 2007
- ASM International N.V
- Theodorus G. M. Oosterlaken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorting/storage device for wafers and method for handling thereof
- Patent number 7,077,614
- Issue date Jul 18, 2006
- ASM International N.V
- Albert Hasper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active pulse monitoring in a chemical reactor
- Patent number 7,063,981
- Issue date Jun 20, 2006
- ASM International N.V
- Niklas Bondestram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sealing porous structures
- Patent number 6,759,325
- Issue date Jul 6, 2004
- ASM Microchemistry OY
- Ivo Raaijmakers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming low-dielectric constant film on semiconductor sub...
- Patent number 6,740,602
- Issue date May 25, 2004
- ASM Japan K.K.
- Menso Hendriks
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for semiconductor processing using mixtures of HF and carbox...
- Patent number 5,922,624
- Issue date Jul 13, 1999
- IMEC vzw
- Steven Verhaverbeke
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DEPOSITING THIN FILMS BY MIXED PULSED CVD AND ALD
- Publication number 20080317972
- Publication date Dec 25, 2008
- ASM International NV
- Menso Hendriks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR SUBSTRATES
- Publication number 20080008975
- Publication date Jan 10, 2008
- ASM INTERNATIONAL N.V.
- Theodorus G. M. Oosterlaken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Active pulse monitoring in a chemical reactor
- Publication number 20060281184
- Publication date Dec 14, 2006
- Niklas Bondestam
- C30 - CRYSTAL GROWTH
Information Patent Application
Method and apparatus for processing semiconductor substrates
- Publication number 20050170662
- Publication date Aug 4, 2005
- Theodorus G. M. Oosterlaken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sealing porous structures
- Publication number 20030143839
- Publication date Jul 31, 2003
- Ivo Raaijmakers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Active pulse monitoring in a chemical reactor
- Publication number 20030143747
- Publication date Jul 31, 2003
- Niklas Bondestam
- C30 - CRYSTAL GROWTH

Menso Hendriks

Person

Patents Grantslast 30 patents

Method for depositing thin films by mixed pulsed CVD and ALD

Active reactant vapor pulse monitoring in a chemical reactor

Method and apparatus for processing semiconductor substrates

Sorting/storage device for wafers and method for handling thereof

Active pulse monitoring in a chemical reactor

Sealing porous structures

Method of forming low-dielectric constant film on semiconductor sub...

Method for semiconductor processing using mixtures of HF and carbox...

Patents Applicationslast 30 patents

METHOD FOR DEPOSITING THIN FILMS BY MIXED PULSED CVD AND ALD

METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR SUBSTRATES

Active pulse monitoring in a chemical reactor

Method and apparatus for processing semiconductor substrates

Sealing porous structures

Active pulse monitoring in a chemical reactor