Merritt Funk

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel resonance antenna for radial plasma control
- Patent number 12,074,390
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for real-time pulse measurement and pulse timing adjustment...
- Patent number 12,057,293
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,817,296
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 11,728,135
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,721,524
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF measurement system and method
- Patent number 11,410,832
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,094,507
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modules, multi-stage systems, and related methods for radio frequen...
- Patent number 11,050,394
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Microwave plasma device
- Patent number 10,796,916
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for controlling plasma performance
- Patent number 10,510,512
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell resonator microwave surface-wave plasma apparatus
- Patent number 10,424,462
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-sustained non-ambipolar direct current (DC) plasma at low power
- Patent number 10,395,903
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-ambipolar electric pressure plasma uniformity control
- Patent number 10,388,528
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low electron temperature, edge-density enhanced, surface-wave plasm...
- Patent number 10,375,812
- Issue date Aug 6, 2019
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation and control using a DC ring
- Patent number 10,354,841
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-sustained non-ambipolar direct current (DC) plasma at low power
- Patent number 9,978,568
- Issue date May 22, 2018
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,947,515
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 9,941,126
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 9,934,974
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for high precision etching of substrates
- Patent number 9,881,804
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dipole ring magnet assisted microwave radial line slot antenna plas...
- Patent number 9,852,893
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energetic negative ion impact ionization plasma
- Patent number 9,799,494
- Issue date Oct 24, 2017
- Tokyo Electron Limited
- Lee Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,793,095
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma tuning rods in microwave resonator plasma sources
- Patent number 9,728,416
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PLASMA PROCESSING
- Publication number 20250069852
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240380114
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...
- Publication number 20240347319
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Plasma Processing
- Publication number 20240213005
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DIAGNOSIS OF PLASMA SYSTEM
- Publication number 20240203713
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel Resonance Antenna for Radial Plasma Control
- Publication number 20240162619
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Plasma Processing
- Publication number 20230377845
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20230282446
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS
- Publication number 20230132660
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Plasma Processing
- Publication number 20230054430
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...
- Publication number 20220367149
- Publication date Nov 17, 2022
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407770
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Measurement System and Method
- Publication number 20210407771
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Generation Systems and Methods for Plasma Stability and Control
- Publication number 20210343504
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL
- Publication number 20210027992
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS
- Publication number 20210013005
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...
- Publication number 20200395901
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...
- Publication number 20200273678
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE
- Publication number 20190228950
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER
- Publication number 20180269041
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA DEVICE
- Publication number 20180226255
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Generation and Control Using a DC Ring
- Publication number 20160300738
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PNEUMATIC COUNTERBALANCE FOR ELECTRODE GAP CONTROL
- Publication number 20160293388
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGETIC NEGATIVE ION IMPACT IONIZATION PLASMA
- Publication number 20160293386
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIPOLE RING MAGNET ASSISTED MICROWAVE RADIAL LINE SLOT ANTENNA PLAS...
- Publication number 20160293389
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL
- Publication number 20160268136
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR HIGH PRECISION ETCHING OF SUBSTRATES
- Publication number 20160218011
- Publication date Jul 28, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Merritt Funk

Person

Patents Grantslast 30 patents

Process control enabled VDC sensor for plasma process

Radio frequency (RF) system with embedded RF signal pickups

RF voltage and current (V-I) sensors and measurement methods

Apparatus for plasma processing

Parallel resonance antenna for radial plasma control

Methods for real-time pulse measurement and pulse timing adjustment...

RF voltage and current (V-I) sensors and measurement methods

Electric pressure systems for control of plasma properties and unif...

Power generation systems and methods for plasma stability and control

RF voltage and current (V-I) sensors and measurement methods

RF measurement system and method

Methods and systems for focus ring thickness determinations and fee...

Power generation systems and methods for plasma stability and control

Modules, multi-stage systems, and related methods for radio frequen...

Microwave plasma device

Methods and systems for controlling plasma performance

Multi-cell resonator microwave surface-wave plasma apparatus

Self-sustained non-ambipolar direct current (DC) plasma at low power

Non-ambipolar electric pressure plasma uniformity control

Low electron temperature, edge-density enhanced, surface-wave plasm...

Plasma generation and control using a DC ring

Self-sustained non-ambipolar direct current (DC) plasma at low power

Microwave surface-wave plasma device

Microwave plasma device

Microwave plasma device

Method and system for high precision etching of substrates

Dipole ring magnet assisted microwave radial line slot antenna plas...

Energetic negative ion impact ionization plasma

Microwave surface-wave plasma device

Plasma tuning rods in microwave resonator plasma sources

Patents Applicationslast 30 patents

METHOD FOR PLASMA PROCESSING

APPARATUS FOR PLASMA PROCESSING

Parallel Resonance Antenna for Radial Plasma Control

SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT...

System and Method for Plasma Processing

IN-SITU DIAGNOSIS OF PLASMA SYSTEM

Parallel Resonance Antenna for Radial Plasma Control

RF Voltage and Current (V-I) Sensors and Measurement Methods

Apparatus for Plasma Processing

APPARATUS FOR PLASMA PROCESSING

RADIO FREQUENCY (RF) SYSTEM WITH EMBEDDED RF SIGNAL PICKUPS

Apparatus for Plasma Processing

Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Measurement System and Method

Power Generation Systems and Methods for Plasma Stability and Control

POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL

PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS

MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...

METHODS AND SYSTEMS FOR FOCUS RING THICKNESS DETERMINATIONS AND FEE...

METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE

SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER

MICROWAVE PLASMA DEVICE

Plasma Generation and Control Using a DC Ring

PNEUMATIC COUNTERBALANCE FOR ELECTRODE GAP CONTROL

ENERGETIC NEGATIVE ION IMPACT IONIZATION PLASMA

DIPOLE RING MAGNET ASSISTED MICROWAVE RADIAL LINE SLOT ANTENNA PLAS...

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

METHOD AND SYSTEM FOR HIGH PRECISION ETCHING OF SUBSTRATES