Mi-Kyung WOO

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Daegu-si, KR

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Patents Grantslast 30 patents

Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,940,725
- Issue date Mar 26, 2024
- S&S TECH CO., LTD.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,927,880
- Issue date Mar 12, 2024
- S&S TECH Co., Ltd.
- Yong-Dae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLANKMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM, AND PHOTOMASK FA...
- Publication number 20240329515
- Publication date Oct 3, 2024
- S&S TECH Co., Ltd.
- Min-Kyu PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240329516
- Publication date Oct 3, 2024
- S&S TECH Co., Ltd.
- Min-Kwang PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126163
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20220269160
- Publication date Aug 25, 2022
- S&S TECH CO., LTD.
- Yong-Dae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20220236635
- Publication date Jul 28, 2022
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS