Miao YU

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Best, NL

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Patents Grantslast 30 patents

Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,614,689
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,231,653
- Issue date Jan 25, 2022
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection substrate and an inspection method
- Patent number 11,099,490
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Jeroen Arnoldus Leonardus Johannes Raaymakers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning device and method of cleaning
- Patent number 11,086,239
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Miao Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 10,969,695
- Issue date Apr 6, 2021
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection substrate and an inspection method
- Patent number 10,725,390
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Seerwan Saeed
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement substrate, a measurement method and a measurement system
- Patent number 10,451,981
- Issue date Oct 22, 2019
- ASML Netherlands B.V.
- Tiannan Guan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 10,416,571
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection substrate and an inspection method
- Patent number 10,345,713
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Jeroen Arnoldus Leonardus Johannes Raaymakers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection substrate and an inspection method
- Patent number 10,216,100
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Seerwan Saeed
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS
- Publication number 20220137519
- Publication date May 5, 2022
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS
- Publication number 20210181641
- Publication date Jun 17, 2021
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING DEVICE AND METHOD OF CLEANING
- Publication number 20210116824
- Publication date Apr 22, 2021
- ASML NETHERLANDS B.V.
- Miao YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS
- Publication number 20200004162
- Publication date Jan 2, 2020
- ASML NETHERLANDS H.V.
- Erik Henricus Egidius Catharina EUMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A MEASUREMENT SUBSTRATE, A MEASUREMENT METHOD AND A MEASUREMENT SYSTEM
- Publication number 20190243257
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Tiannan GUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN INSPECTION SUBSTRATE AND AN INSPECTION METHOD
- Publication number 20190179230
- Publication date Jun 13, 2019
- ASML NETHERLANDS B.V.
- Jeroen Arnoldus Leonardus Johannes RAAYMAKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Substrate and an Inspection Method
- Publication number 20190146352
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Seerwan Saeed
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN INSPECTION SUBSTRATE AND AN INSPECTION METHOD
- Publication number 20190137885
- Publication date May 9, 2019
- ASML NETHERLANDS B.V.
- Jeroen Arnoldus Leonardus Johannes RAAYMAKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS
- Publication number 20190004434
- Publication date Jan 3, 2019
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Substrate and an Inspection Method
- Publication number 20180181004
- Publication date Jun 28, 2018
- ASML NETHERLANDS B.V.
- Seerwan SAEED
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Fluid handling structure and lithographic apparatus

Fluid handling structure and lithographic apparatus

Inspection substrate and an inspection method

Cleaning device and method of cleaning

Fluid handling structure and lithographic apparatus

Inspection substrate and an inspection method

Measurement substrate, a measurement method and a measurement system

Fluid handling structure and lithographic apparatus

Inspection substrate and an inspection method

Inspection substrate and an inspection method

Patents Applicationslast 30 patents

FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

CLEANING DEVICE AND METHOD OF CLEANING

FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

A MEASUREMENT SUBSTRATE, A MEASUREMENT METHOD AND A MEASUREMENT SYSTEM

AN INSPECTION SUBSTRATE AND AN INSPECTION METHOD

Inspection Substrate and an Inspection Method

AN INSPECTION SUBSTRATE AND AN INSPECTION METHOD

FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

Inspection Substrate and an Inspection Method