Michael Bakeman

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Computationally efficient x-ray based overlay measurement
- Patent number 11,428,650
- Issue date Aug 30, 2022
- KLA Corporation
- John Hench
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Metrology tool with combined X-ray and optical scatterometers
- Patent number 10,801,975
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Computationally efficient X-ray based overlay measurement
- Patent number 10,545,104
- Issue date Jan 28, 2020
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Grant
Measurement system optimization for X-ray based metrology
- Patent number 10,324,050
- Issue date Jun 18, 2019
- KLA-Tencor Corporation
- John J. Hench
- G01 - MEASURING TESTING
Information Patent Grant
X-ray based metrology with primary and secondary illumination sources
- Patent number 10,012,606
- Issue date Jul 3, 2018
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Model building and analysis engine for combined X-ray and optical m...
- Patent number 10,013,518
- Issue date Jul 3, 2018
- KLA-Tencor Corporation
- Michael S. Bakeman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Confined illumination for small spot size metrology
- Patent number 10,006,865
- Issue date Jun 26, 2018
- KLA-Tencor Corporation
- Derrick Shaughnessy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for measuring semiconductor device overlay us...
- Patent number 9,885,962
- Issue date Feb 6, 2018
- KLA-Tencor Corporation
- Andrei Veldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Small-angle scattering X-ray metrology systems and methods
- Patent number 9,846,132
- Issue date Dec 19, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Compac X-ray source for semiconductor metrology
- Patent number 9,826,614
- Issue date Nov 21, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology tool with combined XRF and SAXS capabilities
- Patent number 9,778,213
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Confined illumination for small spot size metrology
- Patent number 9,719,932
- Issue date Aug 1, 2017
- KLA-Tencor Corporation
- Derrick Shaughnessy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness liquid droplet X-ray source for semiconductor metro...
- Patent number 9,693,439
- Issue date Jun 27, 2017
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Combined x-ray and optical metrology
- Patent number 9,535,018
- Issue date Jan 3, 2017
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scatterometry-based imaging and critical dimension metrology
- Patent number 9,494,535
- Issue date Nov 15, 2016
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology using targets with field enhancement elements
- Patent number 8,879,073
- Issue date Nov 4, 2014
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Computationally Efficient X-ray Based Overlay Measurement
- Publication number 20200116655
- Publication date Apr 16, 2020
- KLA Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Application
Computationally Efficient X-ray Based Overlay Measurement
- Publication number 20160320319
- Publication date Nov 3, 2016
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Application
Measurement System Optimization For X-Ray Based Metrology
- Publication number 20160202193
- Publication date Jul 14, 2016
- KLA-Tencor Corporation
- John J. Hench
- G01 - MEASURING TESTING
Information Patent Application
Scatterometry-Based Imaging and Critical Dimension Metrology
- Publication number 20150300965
- Publication date Oct 22, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...
- Publication number 20150117610
- Publication date Apr 30, 2015
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS
- Publication number 20150110249
- Publication date Apr 23, 2015
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
Metrology Tool With Combined XRF And SAXS Capabilities
- Publication number 20150051877
- Publication date Feb 19, 2015
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
Combined X-Ray and Optical Metrology
- Publication number 20150032398
- Publication date Jan 29, 2015
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- G01 - MEASURING TESTING
Information Patent Application
MODEL BUILDING AND ANALYSIS ENGINE FOR COMBINED X-RAY AND OPTICAL M...
- Publication number 20140019097
- Publication date Jan 16, 2014
- Michael S. Bakeman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Tool With Combined X-Ray And Optical Scatterometers
- Publication number 20130304424
- Publication date Nov 14, 2013
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology Using Targets With Field Enhancement Elements
- Publication number 20130222795
- Publication date Aug 29, 2013
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING

Michael Bakeman

Person

Patents Grantslast 30 patents

Computationally efficient x-ray based overlay measurement

Metrology tool with combined X-ray and optical scatterometers

Computationally efficient X-ray based overlay measurement

Measurement system optimization for X-ray based metrology

X-ray based metrology with primary and secondary illumination sources

Model building and analysis engine for combined X-ray and optical m...

Confined illumination for small spot size metrology

Methods and apparatus for measuring semiconductor device overlay us...

Small-angle scattering X-ray metrology systems and methods

Compac X-ray source for semiconductor metrology

Metrology tool with combined XRF and SAXS capabilities

Confined illumination for small spot size metrology

High brightness liquid droplet X-ray source for semiconductor metro...

Combined x-ray and optical metrology

Scatterometry-based imaging and critical dimension metrology

Optical metrology using targets with field enhancement elements

Patents Applicationslast 30 patents

Computationally Efficient X-ray Based Overlay Measurement

Computationally Efficient X-ray Based Overlay Measurement

Measurement System Optimization For X-Ray Based Metrology

Scatterometry-Based Imaging and Critical Dimension Metrology

METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...

SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS

Metrology Tool With Combined XRF And SAXS Capabilities

Combined X-Ray and Optical Metrology

MODEL BUILDING AND ANALYSIS ENGINE FOR COMBINED X-RAY AND OPTICAL M...

Metrology Tool With Combined X-Ray And Optical Scatterometers

Optical Metrology Using Targets With Field Enhancement Elements