Michael C. Vella

Person

San Leandro, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Device having preformed triple junctions to maintain electrode cond...
- Patent number 9,903,016
- Issue date Feb 27, 2018
- E/G Electro-Graph, Inc.
- Michael Vella
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ triple junction formation to maintain electrode conductivity
- Patent number 9,551,061
- Issue date Jan 24, 2017
- E/G Electro-Graph Inc.
- Michael Vella
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic field reduction apparatus and magnetic plasma flood system...
- Patent number 8,686,640
- Issue date Apr 1, 2014
- E/G Electro-Graph Inc.
- Michael Vella
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Thermal regulation of an ion implantation system
- Patent number 6,670,623
- Issue date Dec 30, 2003
- Advanced Technology Materials, Inc.
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge exchange molecular ion source
- Patent number 6,573,510
- Issue date Jun 3, 2003
- The Regents of the University of California
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double chamber ion implantation system
- Patent number 6,545,419
- Issue date Apr 8, 2003
- Advanced Technology Materials, Inc.
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic filter apparatus and method for generating cold plasma in...
- Patent number 5,545,257
- Issue date Aug 13, 1996
- Electro-Graph, Inc.
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEVICE HAVING PREFORMED TRIPLE JUNCTIONS TO MAINTAIN ELECTRODE COND...
- Publication number 20170107608
- Publication date Apr 20, 2017
- E/G ELECTRO-GRAPH, INC.
- MICHAEL VELLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU TRIPLE JUNCTION FORMATION TO MAINTAIN ELECTRODE CONDUCTIVITY
- Publication number 20160115581
- Publication date Apr 28, 2016
- E/G ELECTRO-GRAPH, INC.
- MICHAEL VELLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GEOMETRIC FIELD ENHANCEMENT TO MAINTAIN ELECTRODE CONDUCTIVITY
- Publication number 20160118220
- Publication date Apr 28, 2016
- E/G ELECTRO-GRAPH, INC.
- MICHAEL VELLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD REDUCTION APPARATUS AND MAGNETIC PLASMA FLOOD SYSTEM...
- Publication number 20130113378
- Publication date May 9, 2013
- E/G ELECTROGRAPH INC.
- MICHAEL C. VELLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal regulation of an ion implantation system
- Publication number 20020130278
- Publication date Sep 19, 2002
- Advanced Technology Materials Inc.
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double chamber ion implantation system
- Publication number 20020125829
- Publication date Sep 12, 2002
- Advanced Technology Materials Inc.
- Michael C. Vella
- H01 - BASIC ELECTRIC ELEMENTS

Michael C. Vella

Person

Patents Grantslast 30 patents

Device having preformed triple junctions to maintain electrode cond...

In-situ triple junction formation to maintain electrode conductivity

Magnetic field reduction apparatus and magnetic plasma flood system...

Thermal regulation of an ion implantation system

Charge exchange molecular ion source

Double chamber ion implantation system

Magnetic filter apparatus and method for generating cold plasma in...

Patents Applicationslast 30 patents

DEVICE HAVING PREFORMED TRIPLE JUNCTIONS TO MAINTAIN ELECTRODE COND...

IN-SITU TRIPLE JUNCTION FORMATION TO MAINTAIN ELECTRODE CONDUCTIVITY

GEOMETRIC FIELD ENHANCEMENT TO MAINTAIN ELECTRODE CONDUCTIVITY

MAGNETIC FIELD REDUCTION APPARATUS AND MAGNETIC PLASMA FLOOD SYSTEM...

Thermal regulation of an ion implantation system

Double chamber ion implantation system