Michael Chang

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Hsin Chu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Carbon and halogen doped silicate glass dielectric layer and method...
- Patent number 6,979,656
- Issue date Dec 27, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiu-Ko Jangjian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a uniform ultra-thin gate oxide layer
- Patent number 6,602,799
- Issue date Aug 5, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Chun Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Carbon and halogen doped silicate glass dielectric layer and method...
- Publication number 20050121751
- Publication date Jun 9, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiu-Ko Jangjian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a uniform ultra-thin gate oxide layer
- Publication number 20030054596
- Publication date Mar 20, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Chun Chen
- H01 - BASIC ELECTRIC ELEMENTS