Michael E. Kling

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for reducing incidental exposure by using a ph...
- Patent number 6,573,010
- Issue date Jun 3, 2003
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using double exposure effects during phase shifting to control line...
- Patent number 6,566,019
- Issue date May 20, 2003
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic proximity correction through subset feature modification
- Patent number 5,958,635
- Issue date Sep 28, 1999
- Motorola, Inc.
- Alfred John Reich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two dimensional lithographic proximity correction using DRC shape f...
- Patent number 5,920,487
- Issue date Jul 6, 1999
- Motorola Inc.
- Alfred J. Reich
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
One dimensional lithographic proximity correction using DRC shape f...
- Patent number 5,900,340
- Issue date May 4, 1999
- Motorola, Inc.
- Alfred J. Reich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing and inspecting a lithographic reticle and fab...
- Patent number 5,849,440
- Issue date Dec 15, 1998
- Motorola, Inc.
- Kevin D. Lucas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of designing a reticle and forming a semiconductor device t...
- Patent number 5,827,625
- Issue date Oct 27, 1998
- Motorola, Inc.
- Kevin Lucas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for reducing incidental exposure by using a ph...
- Publication number 20020142231
- Publication date Oct 3, 2002
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using double exposure effects during phase shifting to control line...
- Publication number 20020142232
- Publication date Oct 3, 2002
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Michael E. Kling

Person

Patents Grantslast 30 patents

Method and apparatus for reducing incidental exposure by using a ph...

Using double exposure effects during phase shifting to control line...

Lithographic proximity correction through subset feature modification

Two dimensional lithographic proximity correction using DRC shape f...

One dimensional lithographic proximity correction using DRC shape f...

Process for producing and inspecting a lithographic reticle and fab...

Methods of designing a reticle and forming a semiconductor device t...

Patents Applicationslast 30 patents

Method and apparatus for reducing incidental exposure by using a ph...

Using double exposure effects during phase shifting to control line...