Michael Francis Houlihan

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Millington, NJ, US

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist suitable for use in 157 nm photolithography and includi...
- Patent number 7,169,531
- Issue date Jan 30, 2007
- Infineon Technologies, AG
- Christoph Hohle
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Photoresist suitable for use in 157 nm photolithography and includi...
- Publication number 20050170279
- Publication date Aug 4, 2005
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY