Michael Friedmann

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for compact, small spot size soft x-ray scatter...
- Patent number 12,013,355
- Issue date Jun 18, 2024
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Collecting and recycling rare gases in semiconductor processing equ...
- Patent number 11,557,462
- Issue date Jan 17, 2023
- KLA Corporation
- Chao Chang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Methods and systems for semiconductor metrology based on polychroma...
- Patent number 11,333,621
- Issue date May 17, 2022
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser produced plasma illuminator with low atomic number cryogenic...
- Patent number 11,272,607
- Issue date Mar 8, 2022
- KLA Corporation
- Chao Chang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Variable aperture mask
- Patent number 11,268,901
- Issue date Mar 8, 2022
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Laser produced plasma illuminator with liquid sheet jet target
- Patent number 11,259,394
- Issue date Feb 22, 2022
- KLA Corporation
- Chao Chang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for pumping laser sustained plasma with interlace...
- Patent number 11,121,521
- Issue date Sep 14, 2021
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray zoom lens for small angle x-ray scatterometry
- Patent number 10,859,518
- Issue date Dec 8, 2020
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for co-located metrology
- Patent number 10,804,167
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Variable aperture mask
- Patent number 10,663,392
- Issue date May 26, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for metrology beam stabilization
- Patent number 10,365,211
- Issue date Jul 30, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G02 - OPTICS
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,933,016
- Issue date Apr 26, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,876,440
- Issue date Jan 25, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,663,753
- Issue date Feb 16, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,564,557
- Issue date Jul 21, 2009
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,433,040
- Issue date Oct 7, 2008
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,385,699
- Issue date Jun 10, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,379,183
- Issue date May 27, 2008
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,317,531
- Issue date Jan 8, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,301,634
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,298,481
- Issue date Nov 20, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,289,213
- Issue date Oct 30, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,280,212
- Issue date Oct 9, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Measuring overlay and profile asymmetry using symmetric and anti-sy...
- Patent number 7,277,172
- Issue date Oct 2, 2007
- KLA-Tencor Technologies, Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,242,477
- Issue date Jul 10, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Methods And Systems For Compact, Small Spot Size Soft X-Ray Scatter...
- Publication number 20220196576
- Publication date Jun 23, 2022
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
Laser Produced Plasma Illuminator With Low Atomic Number Cryogenic...
- Publication number 20210136902
- Publication date May 6, 2021
- KLA Corporation
- Chao Chang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Laser Produced Plasma Illuminator With Liquid Sheet Jet Target
- Publication number 20210136901
- Publication date May 6, 2021
- KLA Corporation
- Chao Chang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COLLECTING AND RECYCLING RARE GASES IN SEMICONDUCTOR PROCESSING EQU...
- Publication number 20200294774
- Publication date Sep 17, 2020
- KLA Corporation
- Chao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Pumping Laser Sustained Plasma with Interlace...
- Publication number 20200274314
- Publication date Aug 27, 2020
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Aperture Mask
- Publication number 20200271569
- Publication date Aug 27, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Co-Located Metrology
- Publication number 20200243400
- Publication date Jul 30, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems And Methods For Metrology Beam Stabilization
- Publication number 20190094130
- Publication date Mar 28, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Variable Aperture Mask
- Publication number 20190049365
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G02 - OPTICS
Information Patent Application
Methods And Systems For Semiconductor Metrology Based On Polychroma...
- Publication number 20190017946
- Publication date Jan 17, 2019
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-Ray Zoom Lens For Small Angle X-Ray Scatterometry
- Publication number 20180188192
- Publication date Jul 5, 2018
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20100091284
- Publication date Apr 15, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20090284744
- Publication date Nov 19, 2009
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080094630
- Publication date Apr 24, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080049226
- Publication date Feb 28, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080024766
- Publication date Jan 31, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Measuring overlay and profile asymmetry using symmetric and anti-sy...
- Publication number 20060274310
- Publication date Dec 7, 2006
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040257571
- Publication date Dec 23, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233442
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233443
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233439
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233441
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233440
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233444
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for detecting overlay errors using scatterometry
- Publication number 20040169861
- Publication date Sep 2, 2004
- KLA-Tenor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING

Michael Friedmann

Person

Patents Grantslast 30 patents

Methods and systems for compact, small spot size soft x-ray scatter...

Collecting and recycling rare gases in semiconductor processing equ...

Methods and systems for semiconductor metrology based on polychroma...

Laser produced plasma illuminator with low atomic number cryogenic...

Variable aperture mask

Laser produced plasma illuminator with liquid sheet jet target

System and method for pumping laser sustained plasma with interlace...

X-ray zoom lens for small angle x-ray scatterometry

Methods and systems for co-located metrology

Variable aperture mask

Systems and methods for metrology beam stabilization

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Measuring overlay and profile asymmetry using symmetric and anti-sy...

Apparatus and methods for detecting overlay errors using scatterometry

Patents Applicationslast 30 patents

Methods And Systems For Compact, Small Spot Size Soft X-Ray Scatter...

Laser Produced Plasma Illuminator With Low Atomic Number Cryogenic...

Laser Produced Plasma Illuminator With Liquid Sheet Jet Target

COLLECTING AND RECYCLING RARE GASES IN SEMICONDUCTOR PROCESSING EQU...

System and Method for Pumping Laser Sustained Plasma with Interlace...

Variable Aperture Mask

Methods And Systems For Co-Located Metrology

Systems And Methods For Metrology Beam Stabilization

Variable Aperture Mask

Methods And Systems For Semiconductor Metrology Based On Polychroma...

X-Ray Zoom Lens For Small Angle X-Ray Scatterometry

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Measuring overlay and profile asymmetry using symmetric and anti-sy...

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and method for detecting overlay errors using scatterometry