Membership
Tour
Register
Log in
Michael G. Chafin
Follow
Person
US
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Method for controlling a plasma process
Patent number
11,447,868
Issue date
Sep 20, 2022
Applied Materials, Inc.
Andrew Nguyen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Radio frequency filter system for a processing chamber
Patent number
10,840,062
Issue date
Nov 17, 2020
Applied Materials, Inc.
Andrew Nguyen
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
Method, apparatus and system for wafer dechucking using dynamic vol...
Patent number
10,546,731
Issue date
Jan 28, 2020
Applied Materials, Inc.
Haitao Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Non-intrusive measurement of a wafer DC self-bias in semiconductor...
Patent number
9,601,301
Issue date
Mar 21, 2017
Applied Materials, Inc.
Sergey G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor electrostatic chuck with cooled process ring and hea...
Patent number
9,070,536
Issue date
Jun 30, 2015
Applied Materials, Inc.
Michael D. Willwerth
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature enhanced electrostatic chucking in plasma processing ap...
Patent number
8,580,693
Issue date
Nov 12, 2013
Applied Materials, Inc.
Sergey G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrostatic chuck with reduced arcing
Patent number
8,270,141
Issue date
Sep 18, 2012
Applied Materials, Inc.
Michael D. Willwerth
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Plasma control using dual cathode frequency mixing
Patent number
7,838,430
Issue date
Nov 23, 2010
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Time-based wafer de-chucking from an electrostatic chuck having sep...
Patent number
7,813,103
Issue date
Oct 12, 2010
Applied Materials, Inc.
Steven C. Shannon
H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information
Patent Grant
Heated catalytic treatment of an effluent gas from a substrate fabr...
Patent number
6,824,748
Issue date
Nov 30, 2004
Applied Materials, Inc.
Tony S. Kaushal
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate support for plasma processing
Patent number
6,273,958
Issue date
Aug 14, 2001
Applied Materials, Inc.
Shamouil Shamouilian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Connectors for an electrostatic chuck and combination thereof
Patent number
6,151,203
Issue date
Nov 21, 2000
Applied Materials, Inc.
Shamouil Shamouilian
H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information
Patent Grant
High density plasma process chamber
Patent number
6,095,084
Issue date
Aug 1, 2000
Applied Materials, Inc.
Shamouil Shamouilian
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive m...
Patent number
5,903,428
Issue date
May 11, 1999
Applied Materials, Inc.
Dennis S. Grimard
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Barrier seal for electrostatic chuck
Patent number
5,636,098
Issue date
Jun 3, 1997
Applied Materials, Inc.
Joseph Salfelder
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
RADIO FREQUENCY FILTER SYSTEM FOR A PROCESSING CHAMBER
Publication number
20200152423
Publication date
May 14, 2020
Applied Materials, Inc.
Andrew NGUYEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD FOR CONTROLLING A PLASMA PROCESS
Publication number
20180342375
Publication date
Nov 29, 2018
Applied Materials, Inc.
Andrew NGUYEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
NON-INTRUSIVE MEASUREMENT OF A WAFER DC SELF-BIAS IN SEMICONDUCTOR...
Publication number
20140375299
Publication date
Dec 25, 2014
Sergey G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TEMPERATURE ENHANCED ELECTROSTATIC CHUCKING IN PLASMA PROCESSING AP...
Publication number
20140034241
Publication date
Feb 6, 2014
Sergy G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA REACTOR ELECTROSTATIC CHUCK WITH COOLED PROCESS RING AND HEA...
Publication number
20130277339
Publication date
Oct 24, 2013
Michael D. Willwerth
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TEMPERATURE ENHANCED ELECTROSTATIC CHUCKING IN PLASMA PROCESSING AP...
Publication number
20120052690
Publication date
Mar 1, 2012
Applied Materials, Inc.
Sergey G. BELOSTOTSKIY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ELECTROSTATIC CHUCK WITH REDUCED ARCING
Publication number
20110157760
Publication date
Jun 30, 2011
Applied Materials, Inc.
MICHAEL D. WILLWERTH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Time-based wafer de-chucking from an electrostatic chuck having sep...
Publication number
20090097185
Publication date
Apr 16, 2009
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CONTROL USING DUAL CATHODE FREQUENCY MIXING
Publication number
20070000611
Publication date
Jan 4, 2007
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma control using dual cathode frequency mixing
Publication number
20050090118
Publication date
Apr 28, 2005
APPLIED MATERIALS, INC.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Electrostatic chuck with dielectric coating
Publication number
20030010292
Publication date
Jan 16, 2003
APPLIED MATERIALS, INC.
Arnold V. Kholodenko
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Heated catalytic treatment of an effluent gas from a substrate fabr...
Publication number
20020182131
Publication date
Dec 5, 2002
APPLIED MATERIALS, INC.
Tony S. Kaushal
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SUBSTRATE SUPPORT FOR PLASMA PROCESSING
Publication number
20010003298
Publication date
Jun 14, 2001
SHAMOUIL SHAMOUILIAN
H01 - BASIC ELECTRIC ELEMENTS