Michael Geisler

Person

Wahtersbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Sputter devices and methods
- Patent number 11,274,364
- Issue date Mar 15, 2022
- Solayer GmbH
- Martin Portka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glass coating
- Patent number 7,727,632
- Issue date Jun 1, 2010
- Applied Materials GmbH & Co. KG
- Gerd Kleideiter
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Glass coating
- Patent number 7,651,774
- Issue date Jan 26, 2010
- Applied Materials GmbH & Co., KG
- Gerd Kleideiter
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Apparatus for plasma treatment
- Patent number 5,399,254
- Issue date Mar 21, 1995
- Leybold AG
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for coating substrates using a microwave ECR plasma source
- Patent number 5,378,284
- Issue date Jan 3, 1995
- Leybold Aktiengesellschaft
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the production of glow discharge
- Patent number 5,296,784
- Issue date Mar 22, 1994
- Leybold Aktiengesllschaft
- Michael Geisler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a reflective surface on a substrate
- Patent number 5,294,464
- Issue date Mar 15, 1994
- Leybold Aktiengesellschaft
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for coupling microwave power out of a first space into a...
- Patent number 5,283,538
- Issue date Feb 1, 1994
- Leybold Aktiengesellschaft
- Michael Geisler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for mounting and transporting substrates in vacuum apparatus
- Patent number 5,259,603
- Issue date Nov 9, 1993
- Leybold Aktiengesellschaft
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the production of a regular microwave field
- Patent number 5,173,640
- Issue date Dec 22, 1992
- Leybold Aktiengesellschaft
- Michael Geisler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical recording medium
- Patent number 5,118,549
- Issue date Jun 2, 1992
- Leybold Aktiengesellschaft
- Alfons Hausler
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatus for the plasma treatment of substrates
- Patent number 5,113,790
- Issue date May 19, 1992
- Leybold AG
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arrangement for the production of a plasma
- Patent number 5,102,523
- Issue date Apr 7, 1992
- Leybold Aktiengesellschaft
- Siegfried Beisswenger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for depositing silicon oxide on a substrate
- Patent number 5,053,244
- Issue date Oct 1, 1991
- Leybold Aktiengesellschaft
- Jorg Kieser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave cathode sputtering arrangement
- Patent number 5,006,219
- Issue date Apr 9, 1991
- Leybold Aktiengesellschaft
- Rudolf Latz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle source for a reactive ion beam etching or plasma depositio...
- Patent number 4,987,346
- Issue date Jan 22, 1991
- Leybold AG
- Werner Katzschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for producing a plasma and for the treatment of substrates
- Patent number 4,939,424
- Issue date Jul 3, 1990
- Leybold Aktiengesellschaft
- Jorg Kieser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering cathode based on the magnetron principle
- Patent number 4,933,064
- Issue date Jun 12, 1990
- Leybold-Heraeus GmbH
- Michael Geisler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus
- Patent number 4,767,641
- Issue date Aug 30, 1988
- Leybold-Heraeus GmbH
- Jorg Kieser
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
SPUTTER DEVICES AND METHODS
- Publication number 20190003039
- Publication date Jan 3, 2019
- Solayer GmbH
- Martin Portka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF A PROCESS CHAMBER
- Publication number 20120180810
- Publication date Jul 19, 2012
- LEYBOLD OPTICS GMBH
- Rudolf Beckmann
- B08 - CLEANING
Information Patent Application
METHOD AND DEVICE FOR PLASMA TREATMENT OF A FLAT SUBSTRATE
- Publication number 20120097641
- Publication date Apr 26, 2012
- FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGWANDTEN FORSCHUNG E.V.
- Rudolf Beckmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT SYSTEM FOR FLAT SUBSTRATES
- Publication number 20100255196
- Publication date Oct 7, 2010
- LEYBOLD OPTICS GMBH
- Michael Geisler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INFRARED RADIATION REFLECTING LAYER SYSTEM AND METHOD FOR THE PRODU...
- Publication number 20090195865
- Publication date Aug 6, 2009
- Applied Materials GmbH & Co. KG
- Gerd Kleideiter
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SPUTTER CHAMBER FOR COATING A SUBSTRATE
- Publication number 20070227882
- Publication date Oct 4, 2007
- Roland Trassl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Glass coating
- Publication number 20070172647
- Publication date Jul 26, 2007
- Gerd Kleideiter
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Target material and its use in a sputter process
- Publication number 20070163873
- Publication date Jul 19, 2007
- Gerd Kleideiter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Glass coating
- Publication number 20060083932
- Publication date Apr 20, 2006
- Gerd Kleideiter
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Method for coating substrates in inline installations
- Publication number 20050236276
- Publication date Oct 27, 2005
- Albert Kastner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Power coupling for high-power sputtering
- Publication number 20050224343
- Publication date Oct 13, 2005
- Richard Newcomb
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter arrangement with a magnetron and a target
- Publication number 20050178660
- Publication date Aug 18, 2005
- Andreas Lopp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Coating installation
- Publication number 20050145487
- Publication date Jul 7, 2005
- Michael Geisler
- H01 - BASIC ELECTRIC ELEMENTS

Michael Geisler

Person

Patents Grantslast 30 patents

Sputter devices and methods

Glass coating

Glass coating

Apparatus for plasma treatment

Apparatus for coating substrates using a microwave ECR plasma source

Apparatus for the production of glow discharge

Method for producing a reflective surface on a substrate

Apparatus for coupling microwave power out of a first space into a...

Device for mounting and transporting substrates in vacuum apparatus

Apparatus for the production of a regular microwave field

Optical recording medium

Apparatus for the plasma treatment of substrates

Arrangement for the production of a plasma

Process for depositing silicon oxide on a substrate

Microwave cathode sputtering arrangement

Particle source for a reactive ion beam etching or plasma depositio...

Apparatus for producing a plasma and for the treatment of substrates

Sputtering cathode based on the magnetron principle

Plasma treatment apparatus

Patents Applicationslast 30 patents

SPUTTER DEVICES AND METHODS

CLEANING OF A PROCESS CHAMBER

METHOD AND DEVICE FOR PLASMA TREATMENT OF A FLAT SUBSTRATE

TREATMENT SYSTEM FOR FLAT SUBSTRATES

INFRARED RADIATION REFLECTING LAYER SYSTEM AND METHOD FOR THE PRODU...

SPUTTER CHAMBER FOR COATING A SUBSTRATE

Glass coating

Target material and its use in a sputter process

Glass coating

Method for coating substrates in inline installations

Power coupling for high-power sputtering

Sputter arrangement with a magnetron and a target

Coating installation