Michael Gerhard

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for detecting particles on the surface of an object, wafer,...
- Patent number 11,555,783
- Issue date Jan 17, 2023
- Carl Zeiss SMT GmbH
- Oliver Beyer
- G01 - MEASURING TESTING
Information Patent Grant
Optical grating and optical assembly for same
- Patent number 10,578,783
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sebastian Brueck
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system for microlithography
- Patent number 10,088,754
- Issue date Oct 2, 2018
- Carl Zeiss SMT GmbH
- Axel Scholz
- G02 - OPTICS
Information Patent Grant
Method for determining the phase angle and/or the thickness of a co...
- Patent number 9,618,387
- Issue date Apr 11, 2017
- Carl Zeiss SMT GmbH
- Michael Gerhard
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system for microlithography
- Patent number 9,606,441
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic illumination system
- Patent number 9,341,953
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating a projection exposure tool and control apparatus
- Patent number 9,310,693
- Issue date Apr 12, 2016
- Carl Zeiss SMT GmbH
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for microlithography
- Patent number 9,280,060
- Issue date Mar 8, 2016
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical beam deflecting element, illumination system including same...
- Patent number 9,025,131
- Issue date May 5, 2015
- Carl Zeiss SMT GmbH
- Daniel Runde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for microlithography
- Patent number 8,873,023
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrates for mirrors for EUV lithography and their production
- Patent number 8,870,396
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Julian Kaller
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Microlithographic illumination system
- Patent number 8,705,005
- Issue date Apr 22, 2014
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 8,520,307
- Issue date Aug 27, 2013
- Carl Zeiss SMT GmbH
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optical element and illumination optics for microlithography
- Patent number 8,411,251
- Issue date Apr 2, 2013
- Carl Zeiss SMT GmbH
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization rotator and a crystalline-quartz plate for use in an o...
- Patent number 7,961,298
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Michael Gerhard
- G02 - OPTICS
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 7,880,969
- Issue date Feb 1, 2011
- Carl Zeiss SMT AG
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,382,536
- Issue date Jun 3, 2008
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective including deformable mirror w...
- Patent number 7,294,814
- Issue date Nov 13, 2007
- Carl Zeiss SMT AG
- Cristian Wagner
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography
- Patent number 7,271,876
- Issue date Sep 18, 2007
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Grant
Polarization rotator and a crystalline-quartz plate for use in an o...
- Patent number 7,199,864
- Issue date Apr 3, 2007
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,180,667
- Issue date Feb 20, 2007
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,145,720
- Issue date Dec 5, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Objective with fluoride crystal lenses
- Patent number 7,126,765
- Issue date Oct 24, 2006
- Carl Zeiss SMT AG
- Daniel Krähmer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective with adaptive mirror and projecti...
- Patent number 7,112,772
- Issue date Sep 26, 2006
- Carl Zeiss SMT AG
- Cristian Wagner
- G02 - OPTICS
Information Patent Grant
Process for the decontamination of microlithographic projection exp...
- Patent number 6,936,825
- Issue date Aug 30, 2005
- Carl Zeiss SMT AG
- Michael Gerhard
- B08 - CLEANING
Information Patent Grant
Method and apparatus for analysis of schlieren
- Patent number 6,891,980
- Issue date May 10, 2005
- Schott Glas
- Michael Gerhard
- G01 - MEASURING TESTING
Information Patent Grant
Objective with lenses made of a crystalline material
- Patent number 6,842,284
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Grant
Catadioptric objective
- Patent number 6,836,379
- Issue date Dec 28, 2004
- Carl Zeiss SMT AG
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging system with polarizer and a crystalline-quartz plat...
- Patent number 6,774,984
- Issue date Aug 10, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies, AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Grant
Objective with lenses made of a crystalline material
- Patent number 6,697,199
- Issue date Feb 24, 2004
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETECTING PARTICLES ON THE SURFACE OF AN OBJECT, WAFER,...
- Publication number 20200026198
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Oliver BEYER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL GRATING AND OPTICAL ASSEMBLY FOR SAME
- Publication number 20190137668
- Publication date May 9, 2019
- Carl Zeiss SMT GMBH
- Sebastian BRUECK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20170192361
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Axel Scholz
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20160161858
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE PHASE ANGLE AND/OR THE THICKNESS OF A CO...
- Publication number 20160025554
- Publication date Jan 28, 2016
- Carl Zeiss SMT GMBH
- Michael GERHARD
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20150022798
- Publication date Jan 22, 2015
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC ILLUMINATION SYSTEM
- Publication number 20140176930
- Publication date Jun 26, 2014
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Operating a Projection Exposure Tool and Control Apparatus
- Publication number 20130188162
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION
- Publication number 20130120863
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Julian KALLER
- G02 - OPTICS
Information Patent Application
OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME...
- Publication number 20120249988
- Publication date Oct 4, 2012
- CARL ZEISS SMT GMBH
- Daniel Runde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20120019796
- Publication date Jan 26, 2012
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20110083542
- Publication date Apr 14, 2011
- Carl Zeiss SMT GMBH
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND ILLUMINATION OPTICS FOR MICROLITHOGRAPHY
- Publication number 20090201481
- Publication date Aug 13, 2009
- Carl Zeiss SMT AG
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20090021839
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC ILLUMINATION SYSTEM
- Publication number 20090021715
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION ROTATOR AND A CRYSTALLINE-QUARTZ PLATE FOR USE IN AN O...
- Publication number 20080186469
- Publication date Aug 7, 2008
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...
- Publication number 20080055740
- Publication date Mar 6, 2008
- Carl Zeiss SMT AG
- Christian Wagner
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20080049320
- Publication date Feb 28, 2008
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Polarization rotator and a crystalline-quartz plate for use in an o...
- Publication number 20070139636
- Publication date Jun 21, 2007
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...
- Publication number 20070012871
- Publication date Jan 18, 2007
- Christian Wagner
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20060171020
- Publication date Aug 3, 2006
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Polarization rotator and a crystalline-quartz plate for use in an o...
- Publication number 20060119826
- Publication date Jun 8, 2006
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
Projection objective for microlithography
- Publication number 20050134826
- Publication date Jun 23, 2005
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20050122594
- Publication date Jun 9, 2005
- Carl Zeiss SMT AG, a Germany corporation
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Polarization rotator and a crystalline-quartz plate for use in an o...
- Publication number 20040240073
- Publication date Dec 2, 2004
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040190151
- Publication date Sep 30, 2004
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Objective with lenses made of a crystalline material
- Publication number 20040179272
- Publication date Sep 16, 2004
- Carl Zeiss SMT AG
- Michael Gerhard
- G02 - OPTICS
Information Patent Application
Catadioptric projection objective with adaptive mirror and projecti...
- Publication number 20040144915
- Publication date Jul 29, 2004
- Cristian Wagner
- G02 - OPTICS
Information Patent Application
Objective with fluoride crystal lenses
- Publication number 20040105170
- Publication date Jun 3, 2004
- Carl Zeiss SMT AG
- Daniel Krahmer
- G02 - OPTICS
Information Patent Application
Objective with lenses made of a crystalline material
- Publication number 20030137733
- Publication date Jul 24, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Michael Gerhard
- G02 - OPTICS

Michael Gerhard

Person

Patents Grantslast 30 patents

Method for detecting particles on the surface of an object, wafer,...

Optical grating and optical assembly for same

Illumination system for microlithography

Method for determining the phase angle and/or the thickness of a co...

Illumination system for microlithography

Microlithographic illumination system

Method for operating a projection exposure tool and control apparatus

Illumination system for microlithography

Optical beam deflecting element, illumination system including same...

Illumination system for microlithography

Substrates for mirrors for EUV lithography and their production

Microlithographic illumination system

Optical integrator for an illumination system of a microlithographi...

Optical element and illumination optics for microlithography

Polarization rotator and a crystalline-quartz plate for use in an o...

Optical integrator for an illumination system of a microlithographi...

Objective with fluoride crystal lenses

Microlithography projection objective including deformable mirror w...

Projection objective for microlithography

Polarization rotator and a crystalline-quartz plate for use in an o...

Objective with fluoride crystal lenses

Objective with fluoride crystal lenses

Objective with fluoride crystal lenses

Catadioptric projection objective with adaptive mirror and projecti...

Process for the decontamination of microlithographic projection exp...

Method and apparatus for analysis of schlieren

Objective with lenses made of a crystalline material

Catadioptric objective

Optical imaging system with polarizer and a crystalline-quartz plat...

Objective with lenses made of a crystalline material

Patents Applicationslast 30 patents

METHOD FOR DETECTING PARTICLES ON THE SURFACE OF AN OBJECT, WAFER,...

OPTICAL GRATING AND OPTICAL ASSEMBLY FOR SAME

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

METHOD FOR DETERMINING THE PHASE ANGLE AND/OR THE THICKNESS OF A CO...

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC ILLUMINATION SYSTEM

Method for Operating a Projection Exposure Tool and Control Apparatus

SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION

OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME...

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...

OPTICAL ELEMENT AND ILLUMINATION OPTICS FOR MICROLITHOGRAPHY

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...

MICROLITHOGRAPHIC ILLUMINATION SYSTEM

POLARIZATION ROTATOR AND A CRYSTALLINE-QUARTZ PLATE FOR USE IN AN O...

CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

Polarization rotator and a crystalline-quartz plate for use in an o...

CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTI...

Objective with fluoride crystal lenses

Polarization rotator and a crystalline-quartz plate for use in an o...

Projection objective for microlithography

Objective with fluoride crystal lenses

Polarization rotator and a crystalline-quartz plate for use in an o...

Objective with fluoride crystal lenses

Objective with lenses made of a crystalline material

Catadioptric projection objective with adaptive mirror and projecti...

Objective with fluoride crystal lenses

Objective with lenses made of a crystalline material