Michael Goss

Person

Mendon, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,541,141
- Issue date Jan 21, 2020
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,037,890
- Issue date Jul 31, 2018
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching silicon oxide with respect to an org...
- Patent number 10,002,773
- Issue date Jun 19, 2018
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing in-situ deposition of sidewall i...
- Patent number 9,972,502
- Issue date May 15, 2018
- Lam Research Corporation
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removable spacer
- Patent number 7,476,610
- Issue date Jan 13, 2009
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Unique process chemistry for etching organic low-k materials
- Patent number 6,841,483
- Issue date Jan 11, 2005
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon carbide
- Patent number 6,670,278
- Issue date Dec 30, 2003
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POLYMERIZATION PROTECTIVE LINER FOR REACTIVE ION ETCH IN PATTERNING
- Publication number 20220238349
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180330959
- Publication date Nov 15, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...
- Publication number 20180247828
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RESPECT TO AN ORG...
- Publication number 20180102257
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Bhaskar NAGABHIRAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180102253
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...
- Publication number 20170076957
- Publication date Mar 16, 2017
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Removable spacer
- Publication number 20080111166
- Publication date May 15, 2008
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of silicon carbide
- Publication number 20020177322
- Publication date Nov 28, 2002
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Unique process chemistry for etching organic low-k materials
- Publication number 20020111036
- Publication date Aug 15, 2002
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS

Michael Goss

Person

Patents Grantslast 30 patents

Method for selectively etching with reduced aspect ratio dependence

Method for selectively etching with reduced aspect ratio dependence

Method for selectively etching silicon oxide with respect to an org...

Systems and methods for performing in-situ deposition of sidewall i...

Removable spacer

Unique process chemistry for etching organic low-k materials

Method of plasma etching of silicon carbide

Patents Applicationslast 30 patents

POLYMERIZATION PROTECTIVE LINER FOR REACTIVE ION ETCH IN PATTERNING

METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE

SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...

METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RESPECT TO AN ORG...

METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE

SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...

Removable spacer

Method of plasma etching of silicon carbide

Unique process chemistry for etching organic low-k materials