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Michael Grapperhaus
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Gilbert, AZ, US
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Patents Grants
last 30 patents
Information
Patent Grant
Ionized PVD with sequential deposition and etching
Patent number
6,755,945
Issue date
Jun 29, 2004
Tokyo Electron Limited
Tugrul Yasar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for ionized physical vapor deposition
Patent number
6,719,886
Issue date
Apr 13, 2004
Tokyo Electron Limited
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Inductively-coupled plasma processing system
Patent number
6,652,711
Issue date
Nov 25, 2003
Tokyo Electron Limited
Jozef Brcka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Immersed inductively—coupled plasma source
Patent number
6,417,626
Issue date
Jul 9, 2002
Tokyo Electron Limited
Jozef Brcka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for ionized physical vapor deposition
Patent number
6,287,435
Issue date
Sep 11, 2001
Tokyo Electron Limited
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Intelligent system for detection of process status, process fault a...
Publication number
20060259198
Publication date
Nov 16, 2006
TOKYO ELECTRON LIMITED
Jozef Brcka
G05 - CONTROLLING REGULATING
Information
Patent Application
Method of and apparatus for measuring and controlling substrate hol...
Publication number
20050089077
Publication date
Apr 28, 2005
TOKYO ELECTRON LIMITED
William Jones
G01 - MEASURING TESTING
Information
Patent Application
Ionized PVD with sequential deposition and etching
Publication number
20030034244
Publication date
Feb 20, 2003
Tugrul Yasar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of and apparatus for measuring and controlling substrate hol...
Publication number
20030016727
Publication date
Jan 23, 2003
TOKYO ELECTRON LIMITED
William Jones
G01 - MEASURING TESTING
Information
Patent Application
Inductively-coupled plasma processing system
Publication number
20020185229
Publication date
Dec 12, 2002
Tokyo Electron Limited of TBS Broadcast Center
Jozef Brcka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for ionized physical vapor deposition
Publication number
20020104751
Publication date
Aug 8, 2002
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...