Michael Hatzakis

Person

Chappaqua, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation control system
- Patent number 6,097,019
- Issue date Aug 1, 2000
- International Business Machines Corporation
- David Andrew Lewis
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Radiation control system
- Patent number 5,837,978
- Issue date Nov 17, 1998
- International Business Machines Corporation
- Michael Hatzakis
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Dielectric structures having embedded gap filling RIE etch stop pol...
- Patent number 5,565,529
- Issue date Oct 15, 1996
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Microwave processing
- Patent number 5,340,914
- Issue date Aug 23, 1994
- International Business Machines Corporation
- Jerome J. Cuomo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Microwave processing
- Patent number 5,241,040
- Issue date Aug 31, 1993
- International Business Machines Corporation
- Jerome J. Cuomo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Alkaline developable photoresist composition containing radiation s...
- Patent number 5,238,773
- Issue date Aug 24, 1993
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanometer scale probe for an atomic force microscope, and method fo...
- Patent number 5,171,992
- Issue date Dec 15, 1992
- International Business Machines Corporation
- Joachim G. Clabes
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Dielectric structures having embedded gap filling RIE etch stop pol...
- Patent number 5,141,817
- Issue date Aug 25, 1992
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy functional organosilicon polymer
- Patent number 5,115,095
- Issue date May 19, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern
- Patent number 5,110,711
- Issue date May 5, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern of a photoresist
- Patent number 5,098,816
- Issue date Mar 24, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet light sensitive photoinitiator compositions, use thereo...
- Patent number 5,059,512
- Issue date Oct 22, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist and use thereof
- Patent number 5,041,358
- Issue date Aug 20, 1991
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,981,909
- Issue date Jan 1, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,782,008
- Issue date Nov 1, 1988
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic etching process using organosilicon polymer compo...
- Patent number 4,693,960
- Issue date Sep 15, 1987
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Halogenated polystyrenes for electron beam, X-ray and photo resists
- Patent number 4,678,850
- Issue date Jul 7, 1987
- International Business Machines Corp.
- Michael Hatzakis
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organosilicon compound and use thereof in photolithography
- Patent number 4,603,195
- Issue date Jul 29, 1986
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mixed excitation plasma etching system
- Patent number 4,581,100
- Issue date Apr 8, 1986
- International Business Machines Corporation
- Michael Hatzakis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned photoresist process
- Patent number 4,379,833
- Issue date Apr 12, 1983
- International Business Machines Corporation
- Benjamin J. Canavello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image hardening process
- Patent number 4,259,369
- Issue date Mar 31, 1981
- International Business Machines Corporation
- Benjamin J. Canavello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of modifying the development profile of photoresists
- Patent number 4,212,935
- Issue date Jul 15, 1980
- International Business Machines Corporation
- Benjamin J. Canavello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron sensitive resist and a method preparing the same
- Patent number 4,156,745
- Issue date May 29, 1979
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist development control system
- Patent number 4,142,107
- Issue date Feb 27, 1979
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novel resist spinning head
- Patent number 4,086,870
- Issue date May 2, 1978
- International Business Machines Corporation
- Benjamin John Canavello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prebaking treatment for resist mask composition and mask making pro...
- Patent number 4,087,569
- Issue date May 2, 1978
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray lithography mask
- Patent number 4,035,522
- Issue date Jul 12, 1977
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity resist system for lift-off metallization
- Patent number 4,024,293
- Issue date May 17, 1977
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single lithography for multiple-layer bubble domain devices
- Patent number 4,001,061
- Issue date Jan 4, 1977
- International Business Machines Corporation
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing positive resist image
- Patent number 3,984,582
- Issue date Oct 5, 1976
- IBM
- Ralph Feder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Michael Hatzakis

Person

Patents Grantslast 30 patents

Radiation control system

Radiation control system

Dielectric structures having embedded gap filling RIE etch stop pol...

Microwave processing

Microwave processing

Alkaline developable photoresist composition containing radiation s...

Nanometer scale probe for an atomic force microscope, and method fo...

Dielectric structures having embedded gap filling RIE etch stop pol...

Epoxy functional organosilicon polymer

Method for forming a pattern

Method for forming a pattern of a photoresist

Ultraviolet light sensitive photoinitiator compositions, use thereo...

Negative photoresist and use thereof

Plasma-resistant polymeric material, preparation thereof, and use t...

Plasma-resistant polymeric material, preparation thereof, and use t...

Photolithographic etching process using organosilicon polymer compo...

Halogenated polystyrenes for electron beam, X-ray and photo resists

Organosilicon compound and use thereof in photolithography

Mixed excitation plasma etching system

Self-aligned photoresist process

Image hardening process

Method of modifying the development profile of photoresists

Electron sensitive resist and a method preparing the same

Resist development control system

Novel resist spinning head

Prebaking treatment for resist mask composition and mask making pro...

X-ray lithography mask

High sensitivity resist system for lift-off metallization

Single lithography for multiple-layer bubble domain devices

Method for preparing positive resist image