Michael Hummel

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,817,296
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mold for forming a radio frequency (RF) coil for a plasma processin...
- Patent number 11,545,302
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Michael Hummel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantification of processing chamber species by electron energy sweep
- Patent number 11,430,643
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 11,251,021
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 10,910,196
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Balanced RF Resonant Antenna System
- Publication number 20240363310
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Plasma Processing
- Publication number 20240347317
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Quantification of Processing Chamber Species by Electron Energy Sweep
- Publication number 20220102123
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407770
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLD AND METHOD OF FORMING A RADIO FREQUENCY (RF) COIL FOR A PLASMA...
- Publication number 20210233706
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Michael Hummel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mode-Switching Plasma Systems and Methods of Operating Thereof
- Publication number 20210151296
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODE-SWITCHING PLASMA SYSTEMS AND METHODS OF OPERATING THEREOF
- Publication number 20210027991
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Michael Hummel

Person

Patents Grantslast 30 patents

RF voltage and current (V-I) sensors and measurement methods

RF voltage and current (V-I) sensors and measurement methods

RF voltage and current (V-I) sensors and measurement methods

Mold for forming a radio frequency (RF) coil for a plasma processin...

Quantification of processing chamber species by electron energy sweep

Mode-switching plasma systems and methods of operating thereof

Mode-switching plasma systems and methods of operating thereof

Patents Applicationslast 30 patents

Balanced RF Resonant Antenna System

Method and System for Plasma Processing

RF Voltage and Current (V-I) Sensors and Measurement Methods

Quantification of Processing Chamber Species by Electron Energy Sweep

RF Voltage and Current (V-I) Sensors and Measurement Methods

RF Voltage and Current (V-I) Sensors and Measurement Methods

MOLD AND METHOD OF FORMING A RADIO FREQUENCY (RF) COIL FOR A PLASMA...

Mode-Switching Plasma Systems and Methods of Operating Thereof

MODE-SWITCHING PLASMA SYSTEMS AND METHODS OF OPERATING THEREOF