Michael J. McFarland

Person

Washington, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Closed-loop control of tunable optical wavelength filters
- Patent number 6,728,445
- Issue date Apr 27, 2004
- E. I. du Ponte de Nemours and Company
- Robert Blomquist
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Linear illumination sources and systems
- Patent number 6,550,942
- Issue date Apr 22, 2003
- AlliedSignal Inc.
- Han Zou
- F21 - LIGHTING
Information Patent Grant
Linear illumination sources and systems
- Patent number 6,186,649
- Issue date Feb 13, 2001
- Honeywell International Inc.
- Han Zou
- G02 - OPTICS
Information Patent Grant
Thermally-stable photopolymer composition and light transmissive de...
- Patent number 6,114,090
- Issue date Sep 5, 2000
- Corning Incorporated
- Chengjiu Wu
- G02 - OPTICS
Information Patent Grant
Method for forming optically active waveguides
- Patent number 5,541,039
- Issue date Jul 30, 1996
- AlliedSignal Inc.
- Michael J. McFarland
- G02 - OPTICS
Information Patent Grant
Polarizer with an array of tapered waveguides
- Patent number 5,521,726
- Issue date May 28, 1996
- AlliedSignal Inc.
- Scott Zimmerman
- G02 - OPTICS
Information Patent Grant
Direct view display device with array of tapered waveguide on viewe...
- Patent number 5,481,385
- Issue date Jan 2, 1996
- AlliedSignal Inc.
- Scott M. Zimmerman
- G02 - OPTICS
Information Patent Grant
Process for making an array of tapered photopolymerized waveguides
- Patent number 5,462,700
- Issue date Oct 31, 1995
- AlliedSignal Inc.
- Karl W. Beeson
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polymer microstructures which facilitate fiber optic to waveguide c...
- Patent number 5,359,687
- Issue date Oct 25, 1994
- AlliedSignal Inc.
- Michael J. McFarland
- G02 - OPTICS
Information Patent Grant
Polymeric anti-reflection coatings and coated articles
- Patent number 5,225,244
- Issue date Jul 6, 1993
- Allied-Signal Inc.
- Shaul M. Aharoni
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 5,200,529
- Issue date Apr 6, 1993
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electro-optical materials and light modulator devices containing same
- Patent number 5,186,865
- Issue date Feb 16, 1993
- Allied-Signal Inc.
- Chengjiu Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymeric anti-reflection coatings and coated articles
- Patent number 5,178,955
- Issue date Jan 12, 1993
- Allied-Signal Inc.
- Shaul M. Aharoni
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 5,081,001
- Issue date Jan 14, 1992
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electro-optical materials and light modulator devices containing same
- Patent number 5,061,404
- Issue date Oct 29, 1991
- Allied-Signal Inc.
- Chengjiu Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photochemical image process of positive photoresist element with ma...
- Patent number 5,059,513
- Issue date Oct 22, 1991
- Hoechst Celanese Corporation
- Frederick R. Hopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing an image reversal negative photoresist having a...
- Patent number 5,019,488
- Issue date May 28, 1991
- Hoechst Celanese Corporation
- Donald C. Mammato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist of imide containing polymers
- Patent number 4,968,581
- Issue date Nov 6, 1990
- Hoechst Celanese Corporation
- Chengjiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 4,962,171
- Issue date Oct 9, 1990
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist based on imide containing polymers
- Patent number 4,912,018
- Issue date Mar 27, 1990
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
1,3 Disubstituted-5-diazobarbituric acids
- Patent number 4,902,784
- Issue date Feb 20, 1990
- Hoechst Celanese Corporation
- Frederick R. Hopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist thermally stable compositions and elements hav...
- Patent number 4,857,435
- Issue date Aug 15, 1989
- Hoechst Celanese Corporation
- Frederick R. Hopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist of imide containing polymers
- Patent number 4,837,124
- Issue date Jun 6, 1989
- Hoechst Celanese Corporation
- Chengjiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 4,810,613
- Issue date Mar 7, 1989
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal
- Patent number 4,775,609
- Issue date Oct 4, 1988
- Hoescht Celanese Corporation
- Michael J. McFarland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbi...
- Patent number 4,735,885
- Issue date Apr 5, 1988
- Allied Corporation
- Frederick R. Hopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Copolymers from maleimide and aliphatic vinyl ethers and esters use...
- Patent number 4,720,445
- Issue date Jan 19, 1988
- Allied Corporation
- Karime Brahim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CLOSED-LOOP CONTROL OF TUNABLE OPTICAL WAVELENGTH FILTERS
- Publication number 20030223687
- Publication date Dec 4, 2003
- Robert Blomquist
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Thermally-stable photopolymer composition and light transmissive de...
- Publication number 20010031427
- Publication date Oct 18, 2001
- Chengjiu Wu
- G02 - OPTICS
Information Patent Application
Thermally-stable photopolyemer composition and light transmissive d...
- Publication number 20010025061
- Publication date Sep 27, 2001
- Chengjiu Wu
- G02 - OPTICS

Michael J. McFarland

Person

Patents Grantslast 30 patents

Closed-loop control of tunable optical wavelength filters

Linear illumination sources and systems

Linear illumination sources and systems

Thermally-stable photopolymer composition and light transmissive de...

Method for forming optically active waveguides

Polarizer with an array of tapered waveguides

Direct view display device with array of tapered waveguide on viewe...

Process for making an array of tapered photopolymerized waveguides

Polymer microstructures which facilitate fiber optic to waveguide c...

Polymeric anti-reflection coatings and coated articles

Blocked monomer and polymers therefrom for use as photoresists

Electro-optical materials and light modulator devices containing same

Polymeric anti-reflection coatings and coated articles

Blocked monomer and polymers therefrom for use as photoresists

Electro-optical materials and light modulator devices containing same

Photochemical image process of positive photoresist element with ma...

Method of producing an image reversal negative photoresist having a...

High resolution photoresist of imide containing polymers

Blocked monomer and polymers therefrom for use as photoresists

High resolution photoresist based on imide containing polymers

1,3 Disubstituted-5-diazobarbituric acids

Positive photoresist thermally stable compositions and elements hav...

High resolution photoresist of imide containing polymers

Blocked monomer and polymers therefrom for use as photoresists

Image reversal

Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbi...

Copolymers from maleimide and aliphatic vinyl ethers and esters use...

Patents Applicationslast 30 patents

CLOSED-LOOP CONTROL OF TUNABLE OPTICAL WAVELENGTH FILTERS

Thermally-stable photopolymer composition and light transmissive de...

Thermally-stable photopolyemer composition and light transmissive d...